公开(公告)号：US08086021B2

公开(公告)日：2011-12-27

申请号：US12367695

申请日：2009-02-09

申请人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

发明人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

IPC分类号： G06K9/00

CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J37/244 ,  H01J2237/221 ,  H01J2237/24495 ,  H01J2237/2485 ,  H01J2237/2817

摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.

摘要翻译： 本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。 外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。 此外，允许用户选择吞吐量提高或S / N改善以优先化。

公开(公告)号：US08086022B2

公开(公告)日：2011-12-27

申请号：US12179272

申请日：2008-07-24

申请人： Hiroshi Miyai ,  Yusuke Ominami ,  Yasuhiro Gunji

发明人： Hiroshi Miyai ,  Yusuke Ominami ,  Yasuhiro Gunji

IPC分类号： G06K9/00 ,  G06K9/40 ,  G01N23/00

CPC分类号： G01N23/225 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/2817

摘要： An inspection system uses a scanning electron microscope that detects a high-precision electron beam image, and at the same time removes restrictions for a low sampling rate. A sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, and contiguous digital values contained in the sampled signal are added on an N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency. Each, digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.

摘要翻译： 检查系统使用检测高精度电子束图像的扫描电子显微镜，同时消除对低采样率的限制。 通过以预定的采样率对由二次电子检测器产生的模拟亮度信号进行采样来获得采样信号，并且以N×N数值为基础相加在采样信号中包含的连续数字值，以产生数字亮度信号，其频率 等于采样频率的1 / N。 将包含在数字亮度信号中的每个数字值除以N，以产生由具有与采样信号的位数相等的位数的数字值构成的数字信号，并产生其中数字信号的每个数字值 形成一个像素数据。

公开(公告)号：US20090208092A1

公开(公告)日：2009-08-20

申请号：US12367695

申请日：2009-02-09

申请人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

发明人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

IPC分类号： G06K9/00

CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J37/244 ,  H01J2237/221 ,  H01J2237/24495 ,  H01J2237/2485 ,  H01J2237/2817

摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.

摘要翻译： 本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。 外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。 此外，允许用户选择吞吐量提高或S / N改善以优先化。

公开(公告)号：US20120091339A1

公开(公告)日：2012-04-19

申请号：US13378561

申请日：2010-06-15

申请人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

发明人： Yusuke Ominami ,  Hiroshi Miyai ,  Yasuhiro Gunji

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J2237/004 ,  H01J2237/24564 ,  H01J2237/24592

摘要： A charged-particle microscope device and a method of controlling charged-particle beams are provided, which are capable of signal detection at the time when the charged state of an observation sample or a defect portion becomes optimum. Charge accumulation-waiting time T from an initial irradiation with an electron beam 21 for enhancing charge accumulation on an observation sample 100 until a next irradiation with the electron beam 21 for sample observation is set depending on the state of the observation sample 100 or a defect portion 112 generated on the observation sample 100. The irradiation with the electron beam 21 for enhancing charge accumulation and the irradiation with the electron beam 21 for sample observation are performed on the observation sample 100 on the basis of the charge accumulation-waiting time T.

摘要翻译： 提供带电粒子显微镜装置和控制带电粒子束的方法，其能够在观察样品或缺陷部分的充电状态变为最佳时进行信号检测。 根据观察样品100的状态或缺陷来设定用于增强观察样品100上的电荷累积的电子束21的电荷累积等待时间T，直到下一次照射用于样本观察的电子束21为止 在观察样本100上产生的电子束21的照射。基于电荷累积等待时间T，对观察样品100进行用于增强电荷积聚的电子束21的照射和用于样本观察的电子束21的照射。

公开(公告)号：US20090026369A1

公开(公告)日：2009-01-29

申请号：US12179272

申请日：2008-07-24

申请人： Hiroshi MIYAI ,  Yusuke Ominami ,  Yasuhiro Gunji

发明人： Hiroshi MIYAI ,  Yusuke Ominami ,  Yasuhiro Gunji

IPC分类号： G21K1/00 ,  G01N23/00

CPC分类号： G01N23/225 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/2817

摘要： An object of the present invention is to provide an inspection system using a scanning electron microscope that detects a high-precision electron beam image and at the same time, removes restrictions for a low sampling rate, which presents a problem at this point, of an AD converter element and an inspection method.To achieve the object, an embodiment of the present invention is constructed so that a sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, contiguous digital values contained in the sampled signal are added on a N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency, and each digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.

摘要翻译： 本发明的目的是提供一种使用扫描电子显微镜检测高精度电子束图像的检查系统，并且同时消除了在这一点上出现问题的低采样率的限制 AD转换器元件和检查方法。 为了实现该目的，本发明的一个实施例被构造成使得通过以预定采样率对由二次电子检测器产生的模拟亮度信号进行采样来获得采样信号，将包含在采样信号中的连续数字值加到 以N数字值为基础产生频率等于采样频率的1 / N的数字亮度信号，并且将包含在数字亮度信号中的每个数字值除以N，以产生由具有 位数等于采样信号的位数，并产生其中数字信号的每个数字值形成一个像素数据的图像信号。

公开(公告)号：US20080308725A1

公开(公告)日：2008-12-18

申请号：US12132361

申请日：2008-06-03

申请人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

发明人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

IPC分类号： G01N23/00

CPC分类号： G01R31/307

摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

摘要翻译： 具有噪声减除​​功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器， 装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

公开(公告)号：US07838828B2

公开(公告)日：2010-11-23

申请号：US12132361

申请日：2008-06-03

申请人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

发明人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

IPC分类号： H01J37/153 ,  H01J37/073 ,  G01N23/00

CPC分类号： G01R31/307

摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

摘要翻译： 具有噪声减除​​功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器， 装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

公开(公告)号：US08242443B2

公开(公告)日：2012-08-14

申请号：US12860363

申请日：2010-08-20

申请人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

发明人： Yusuke Ominami ,  Yasuhiro Gunji ,  Yoshiyuki Shichida

IPC分类号： H01J37/26 ,  H01J37/244

CPC分类号： G01R31/307

摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.

摘要翻译： 具有噪声减除​​功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器， 装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。 噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

公开(公告)号：US20110278452A1

公开(公告)日：2011-11-17

申请号：US13129201

申请日：2009-10-15

申请人： Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

发明人： Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

IPC分类号： H01J37/26 ,  H01J37/285

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/0048 ,  H01J2237/2008 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.

摘要翻译： 提供了一种图案检查装置，包括：电荷形成装置，其通过从不同于电子源（I）的第二电子源（20）产生电子束，在基板（7）的表面上形成电荷， 电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。 还提供了使用图案检查装置的图案检查方法。 因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。 然后，检查结果反馈给操作。 这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

公开(公告)号：US08421008B2

公开(公告)日：2013-04-16

申请号：US13129201

申请日：2009-10-15

申请人： Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

发明人： Mari Nozoe ,  Hiroshi Miyai ,  Mitsuru Okamura ,  Makoto Suzuki ,  Yusuke Ominami

IPC分类号： H01J37/26 ,  H01J37/304 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/0048 ,  H01J2237/2008 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (1) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.

摘要翻译： 提供了一种图案检查装置，其包括：电荷形成装置，其通过从不同于电子源的电子源（1）产生来自第二电子源（20）的电子束，从而在基板（7）的表面上形成电荷， 电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。 还提供了使用图案检查装置的图案检查方法。 因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。 然后，检查结果反馈给操作。 这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。