Invention Grant
- Patent Title: Photosensitive composition and lithographic printing original plate using the composition
- Patent Title (中): 光敏组合物和平版印刷原版使用组合物
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Application No.: US12289777Application Date: 2008-11-04
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Publication No.: US08088552B2Publication Date: 2012-01-03
- Inventor: Jun Ozaki , Masaro Nakatsuka , Keiko Yonezawa , Naoya Sato
- Applicant: Jun Ozaki , Masaro Nakatsuka , Keiko Yonezawa , Naoya Sato
- Applicant Address: JP Warabi-shi, Saitama-ken
- Assignee: Okamoto Chemical Industry Co., Ltd.
- Current Assignee: Okamoto Chemical Industry Co., Ltd.
- Current Assignee Address: JP Warabi-shi, Saitama-ken
- Agency: Foley & Lardner LLP
- Priority: JP2008-033940 20080215
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/027 ; G03F7/028

Abstract:
A thermal negative type lithographic printing original plate has a photosensitive layer featuring high sensitivity, excellent reproducibility in FM screening, and excellent print durability and chemical resistance at a minute image portion. A photosensitive composition for the photosensitive layer contains an alkali soluble resin having a monomer unit represented by the formula (I), a silane coupling agent represented by the formula (II), an infrared absorber, a radical polymerization initiator, and a polymerizable compound having an ethylenic double bond and an amount of the silane coupling agent is from 15 to 40% of the photosensitive composition by mass.
Public/Granted literature
- US20090208870A1 Photosensitive composition and lithographic printing original plate using the composition Public/Granted day:2009-08-20
Information query
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