发明授权
- 专利标题: Exposure apparatus and method for photolithography process
- 专利标题(中): 用于光刻工艺的曝光装置和方法
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申请号: US11875471申请日: 2007-10-19
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公开(公告)号: US08098364B2公开(公告)日: 2012-01-17
- 发明人: Vinvent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
- 申请人: Vinvent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: G02F1/29
- IPC分类号: G02F1/29 ; G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/54 ; G03B27/72
摘要:
Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided.
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