- 专利标题: Substrate holding apparatus, polishing apparatus, and polishing method
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申请号: US12222908申请日: 2008-08-19
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公开(公告)号: US08100739B2公开(公告)日: 2012-01-24
- 发明人: Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
- 申请人: Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2006-097296 20060331
- 主分类号: B24B49/00
- IPC分类号: B24B49/00
摘要:
A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member.
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