Invention Grant
US08110068B2 Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
有权
气体流量分配容器，等离子体发生器系统和用于执行等离子体剥离工艺的方法
- Patent Title: Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
- Patent Title (中): 气体流量分配容器，等离子体发生器系统和用于执行等离子体剥离工艺的方法
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Application No.: US12052401Application Date: 2008-03-20
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Publication No.: US08110068B2Publication Date: 2012-02-07
- Inventor: Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
- Applicant: Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
- Applicant Address: US CA San Jose
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Knobbe Martens Olson & Bear LLP
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; C23C16/00 ; C23C16/455
Abstract:
Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
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