发明授权
US08110460B2 Method for producing stacked and self-aligned components on a substrate
有权
在基板上制造层叠和自对准部件的方法
- 专利标题： Method for producing stacked and self-aligned components on a substrate
- 专利标题（中）： 在基板上制造层叠和自对准部件的方法
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申请号： US12577379申请日： 2009-10-12
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公开(公告)号： US08110460B2公开(公告)日： 2012-02-07
- 发明人: Romain Wacquez , Philippe Coronel , Vincent Destefanis , Jean-Michel Hartmann
- 申请人： Romain Wacquez , Philippe Coronel , Vincent Destefanis , Jean-Michel Hartmann
- 申请人地址： FR Paris
- 专利权人： Commissariat a l'Energie Atomique
- 当前专利权人： Commissariat a l'Energie Atomique
- 当前专利权人地址： FR Paris
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： FR0857060 20081017
- 主分类号： H01L21/8238
- IPC分类号： H01L21/8238
摘要：
A method for producing stacked and self-aligned components on a substrate, including: providing a substrate made of monocrystalline silicon having one face enabling production of components, forming a stack of layers on the face of the substrate, selective etching by a gaseous mixture comprising gaseous HCl conveyed by a carrier gas and at a temperature between 450° C. and 900° C., depositing resin, implementing lithography of the resin, replacing resin eliminated during the lithography with a material for confining remaining resin, and forming elements of the components.
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