Invention Grant
- Patent Title: System and method for performing photothermal measurements and relaxation compensation
- Patent Title (中): 进行光热测量和放松补偿的系统和方法
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Application No.: US12494734Application Date: 2009-06-30
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Publication No.: US08111399B2Publication Date: 2012-02-07
- Inventor: Lawrence D. Rotter , David Y. Wang , Derrick Shaughnessy , Mark Senko
- Applicant: Lawrence D. Rotter , David Y. Wang , Derrick Shaughnessy , Mark Senko
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A device and methods for performing a photothermal measurement and relaxation compensation of a sample are disclosed. The device may include a probe beam source, a pump beam source, a sample, and a detector array. A method may include adjusting an intensity modulated pump beam power, adjusting a probe beam power to increase a response measurement location temperature and increase a modulated optical reflectance signal, directing the intensity modulated pump beam and the probe beam along a measurement path to a response measurement location on a sample for periodically exciting a region on the sample, detecting a reflected portion of the probe beam, and calculating an implantation dose.
Public/Granted literature
- US20100328670A1 SYSTEM AND METHOD FOR PERFORMING PHOTOTHERMAL MEASUREMENTS AND RELAXATION COMPENSATION Public/Granted day:2010-12-30
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