发明授权
US08111921B2 Method and apparatus for performing model-based OPC for pattern decomposed features
有权
用于模式分解特征执行基于模型的OPC的方法和装置
- 专利标题： Method and apparatus for performing model-based OPC for pattern decomposed features
- 专利标题（中）： 用于模式分解特征执行基于模型的OPC的方法和装置
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申请号： US11898646申请日： 2007-09-13
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公开(公告)号： US08111921B2公开(公告)日： 2012-02-07
- 发明人: Duan-Fu Stephen Hsu , Jung Chul Park , Douglas Van Den Broeke , Jang Fung Chen
- 申请人： Duan-Fu Stephen Hsu , Jung Chul Park , Douglas Van Den Broeke , Jang Fung Chen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Masktools B.V.
- 当前专利权人： ASML Masktools B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G06K9/00
- IPC分类号： G06K9/00 ; G06F17/50 ; H04N7/16
摘要：
A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.
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