Invention Grant
- Patent Title: Multiple laser wavelength and pulse width process drilling
- Patent Title (中): 多激光波长和脉冲宽度工艺钻孔
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Application No.: US11756507Application Date: 2007-05-31
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Publication No.: US08116341B2Publication Date: 2012-02-14
- Inventor: Weisheng Lei , Yunlong Sun , Yasu Osako , John Davignon , Glenn Simenson , Hisashi Matsumoto
- Applicant: Weisheng Lei , Yunlong Sun , Yasu Osako , John Davignon , Glenn Simenson , Hisashi Matsumoto
- Applicant Address: US OR Portland
- Assignee: Electro Scientific Industries, Inc.
- Current Assignee: Electro Scientific Industries, Inc.
- Current Assignee Address: US OR Portland
- Agency: Stoel Rives LLP
- Main IPC: H01S3/109
- IPC: H01S3/109 ; H01S3/10 ; B23K26/38

Abstract:
Dual-beam laser outputs, preferably derived from a single laser beam, improve the quality of the sidewalls of vias drilled in a target material, such as printed circuit board, comprising fiber-reinforced resin. Two embodiments each use two laser output components to remove a portion of target material from a target material location of a workpiece and rapidly clean remnants of the target material bonded to a metal layer underlying the target material location at a material removal rate. A first embodiment entails directing for incidence on a portion of the target material at the target material location a processing laser output having first and second components characterized by respective first and second wavelengths. A second embodiment entails directing for incidence on a portion of the target material at the target material location a processing laser output having first and second components characterized by respective first and pulse widths.
Public/Granted literature
- US20080296272A1 MULTIPLE LASER WAVELENGTH AND PULSE WIDTH PROCESS DRILLING Public/Granted day:2008-12-04
Information query
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