发明授权
- 专利标题: Display device including an opening formed in a gate insulating film, a passivation film, and a barrier film
- 专利标题(中): 显示装置包括形成在栅极绝缘膜中的开口,钝化膜和阻挡膜
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申请号: US11882146申请日: 2007-07-31
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公开(公告)号: US08120031B2公开(公告)日: 2012-02-21
- 发明人: Shunpei Yamazaki , Toru Takayama , Satoshi Murakami , Hajime Kimura
- 申请人: Shunpei Yamazaki , Toru Takayama , Satoshi Murakami , Hajime Kimura
- 申请人地址: JP Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权: JP2002-143711 20020517
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L27/01 ; H01L23/58
摘要:
A structure for preventing deteriorations of a light-emitting device and retaining sufficient capacitor elements (condenser) required by each pixel is provided. A first passivation film, a second metal layer, a flattening film, a barrier film, and a third metal layer are stacked in this order over a transistor. A side face of a first opening provided with the flattening film is covered by the barrier film, a second opening is formed inside the first opening, and a third metal layer is connected to a semiconductor via the first opening and the second opening. A capacitor element that is formed of a lamination of a semiconductor of a transistor, a gate insulating film, a gate electrode, the first passivation film, and the second metal layer is provided.
公开/授权文献
- US20070278489A1 Display device 公开/授权日:2007-12-06
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