发明授权
US08124327B2 Method for using compositions containing fluorocarbinols in lithographic processes 有权
在光刻工艺中使用含有氟代甲醇的组合物的方法

Method for using compositions containing fluorocarbinols in lithographic processes
摘要:
The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
信息查询
0/0