发明授权
- 专利标题: Nitride semiconductor optical element and manufacturing method thereof
- 专利标题(中): 氮化物半导体光学元件及其制造方法
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申请号: US12630008申请日: 2009-12-03
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公开(公告)号: US08124432B2公开(公告)日: 2012-02-28
- 发明人: Tomonobu Tsuchiya , Shigehisa Tanaka , Akihisa Terano , Kouji Nakahara
- 申请人: Tomonobu Tsuchiya , Shigehisa Tanaka , Akihisa Terano , Kouji Nakahara
- 申请人地址: JP Kanagawa
- 专利权人: Opnext Japan, Inc.
- 当前专利权人: Opnext Japan, Inc.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Mattingly & Malur, PC
- 优先权: JP2008-318274 20081215
- 主分类号: H01L21/205
- IPC分类号: H01L21/205 ; H01L31/18 ; H01S5/22 ; H01S5/343
摘要:
In an InGaN-based nitride semiconductor optical device having a long wavelength (440 nm or more) equal to or more than that of blue, the increase of a wavelength is realized while suppressing In (Indium) segregation and deterioration of crystallinity. In the manufacture of an InGaN-based nitride semiconductor optical device having an InGaN-based quantum well active layer including an InGaN well layer and an InGaN barrier layer, a step of growing the InGaN barrier layer includes: a first step of adding hydrogen at 1% or more to a gas atmosphere composed of nitrogen and ammonia and growing a GaN layer in the gas atmosphere; and a second step of growing the InGaN barrier layer in a gas atmosphere composed of nitrogen and ammonia.
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