发明授权
- 专利标题: Charged particle beam apparatus
- 专利标题(中): 带电粒子束装置
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申请号: US12351523申请日: 2009-01-09
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公开(公告)号: US08124940B2公开(公告)日: 2012-02-28
- 发明人: Kunji Shigeto , Takeshi Ogashiwa
- 申请人: Kunji Shigeto , Takeshi Ogashiwa
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2008-008613 20080118
- 主分类号: G21K1/08
- IPC分类号: G21K1/08 ; H01J3/14 ; H01J49/42 ; H01J3/26
摘要:
Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.
公开/授权文献
- US20090184256A1 CHARGED PARTICLE BEAM APPARATUS 公开/授权日:2009-07-23
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