公开(公告)号：US09734981B2

公开(公告)日：2017-08-15

申请号：US15088487

申请日：2016-04-01

申请人： NuFlare Technology, Inc.

发明人： Saori Gomi ,  Hitoshi Higurashi

IPC分类号： H01J37/30 ,  H01J3/26 ,  G21K1/08 ,  G06F9/455 ,  H01J37/147 ,  H01J37/302 ,  H01J37/317 ,  H01J37/20

CPC分类号： H01J37/1472 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/1504 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

摘要： A charged particle beam writing apparatus includes a circuitry to set, when a charged particle beam is deflected to move between plural small regions by a deflector, plural first mesh regions obtained by virtually dividing a chip region into regions by length and width sizes same as those of each of the plural small regions; determine whether a shot figure having been assigned exists in each of the plural first mesh regions; a circuitry to perform, for the plural first mesh regions, merging of two or more adjacent first mesh regions; a circuitry to measure, for each of plural second mesh regions each obtained by merging, the number of first mesh regions each having been determined that an assigned shot figure exists therein; and a circuitry to generate a map for each chip, where measured number of first mesh regions with the shot figure is defined as a map value.

公开(公告)号：US09443691B2

公开(公告)日：2016-09-13

申请号：US14144187

申请日：2013-12-30

申请人： General Electric Company

发明人： Vance Scott Robinson ,  Carey Shawn Rogers ,  Sergio Lemaitre ,  Mark Alan Frontera ,  Sergiy Zalyubovskiy ,  Xi Zhang

IPC分类号： H01J35/06 ,  H01J29/48 ,  H01J29/04 ,  H01L23/367 ,  H01L23/373 ,  H01J3/26 ,  H01J29/00 ,  H01L33/44 ,  H01L33/64 ,  H01L23/31 ,  H01J1/14 ,  H01J1/15

CPC分类号： H01J29/484 ,  H01J1/14 ,  H01J1/15 ,  H01J3/26 ,  H01J29/006 ,  H01J29/04 ,  H01J29/485 ,  H01J35/06 ,  H01L23/3178 ,  H01L23/367 ,  H01L23/373 ,  H01L23/3736 ,  H01L23/3738 ,  H01L33/44 ,  H01L33/641 ,  H01L33/642 ,  H01L2924/0002 ,  Y10T428/24612 ,  Y10T428/24802 ,  Y10T428/24826 ,  Y10T428/24942 ,  Y10T428/2495 ,  H01L2924/00

摘要： Embodiments of the disclosure relate to electron emitters for use in conjunction with X-ray emitting devices. In certain embodiments the emitter includes features that prevent, limit, or control deflection of the electron emitter at operating temperatures. In this manner, the electron emitter may be kept substantially flat or at a desired curvature during operation.

摘要翻译： 本公开的实施例涉及与X射线发射装置结合使用的电子发射器。 在某些实施例中，发射器包括防止，限制或控制电子发射器在工作温度下的偏转的特征。 以这种方式，电子发射器可以在操作期间保持基本上平坦或处于期望的曲率。

公开(公告)号：US09153404B2

公开(公告)日：2015-10-06

申请号：US13705084

申请日：2012-12-04

申请人： Lawrence Livermore National Security, LLC

发明人： Yu-Jiuan Chen

IPC分类号： H01J3/26 ,  A61N5/10 ,  G21K1/087

CPC分类号： H01J3/26 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1087 ,  G21K1/087

摘要： Devices and methods are provided to allow rapid deflection of a charged particle beam. The disclosed devices can, for example, be used as part of a hadron therapy system to allow scanning of a target area within a patient's body. The disclosed charged particle beam deflectors include a dielectric wall accelerator (DWA) with a hollow center and a dielectric wall that is substantially parallel to a z-axis that runs through the hollow center. The dielectric wall includes one or more deformed high gradient insulators (HGIs) that are configured to produce an electric field with an component in a direction perpendicular to the z-axis. A control component is also provided to establish the electric field component in the direction perpendicular to the z-axis and to control deflection of a charged particle beam in the direction perpendicular to the z-axis as the charged particle beam travels through the hollow center of the DWA.

摘要翻译： 提供了装置和方法以允许带电粒子束的快速偏转。 所公开的装置可以例如用作强子治疗系统的一部分，以允许扫描患者体内的目标区域。 所公开的带电粒子束偏转器包括具有中空中心的电介质壁加速器（DWA）和基本平行于穿过中空中心的z轴平行的电介质壁。 电介质壁包括一个或多个变形的高梯度绝缘体（HGI），其被配置为产生具有垂直于z轴的方向的分量的电场。 还提供控制组件以在垂直于z轴的方向上建立电场分量，并且当带电粒子束穿过中空中心时，控制带电粒子束在垂直于z轴的方向上的偏转 DWA。

公开(公告)号：US09024272B2

公开(公告)日：2015-05-05

申请号：US13518706

申请日：2010-12-01

申请人： Kei Sakai ,  Yafeng Zhang ,  Norio Hasegawa

发明人： Kei Sakai ,  Yafeng Zhang ,  Norio Hasegawa

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42 ,  G03F7/20 ,  G06T7/00

CPC分类号： G03F7/70466 ,  G01B2210/56 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J2237/2817

摘要： A pattern measuring apparatus which can identify a kind of gaps formed by a manufacturing process having a plurality of exposing steps such as SADP, particularly, which can suitably access a gap even if a sample has the gap that is not easily accessed is disclosed. A feature amount regarding one end side of a pattern having a plurality of patterns arranged therein and a plurality of kinds of feature amounts regarding the other end side of the pattern are extracted from a signal detected on the basis of scanning of a charged particle beam. With respect to proper kinds of feature amounts among the plurality of kinds of feature amounts, the feature amount on one side of the pattern and that on the other end side of the pattern are compared. On the basis of the comparison, the kinds of spaces among the patterns are determined.

摘要翻译： 公开了一种图案测量装置，其可以识别由具有多个曝光步骤的制造工艺形成的间隙，例如SADP，特别是即使样品具有不容易接近的间隙也能适当地接近间隙。 从基于扫描带电粒子束检测的信号中提取关于其中布置有多个图案的图案的一端侧的特征量和关于图案的另一端侧的多种特征量。 对于多种特征量中的适当种类的特征量，比较图案的一侧的特征量和图案的另一端的特征量。 在比较的基础上，确定了图案间的空间种类。

公开(公告)号：US08921805B2

公开(公告)日：2014-12-30

申请号：US14218563

申请日：2014-03-18

申请人： Carl Zeiss Microscopy GmbH

发明人： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC分类号： H01J3/14 ,  H01J3/26 ,  H01J37/147 ,  H01J37/28 ,  H01J37/317

CPC分类号： H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

摘要： An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

摘要翻译： 离子束系统包括电压供应系统7和至少一个具有至少一个第一偏转电极51a，51b，51c和多个第二偏转电极52a，52b，52c的光束偏转器39，其中电压供应系统被配置为提供不同的 可变偏转电压到多个第二偏转电极，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

公开(公告)号：US20140374617A1

公开(公告)日：2014-12-25

申请号：US14313128

申请日：2014-06-24

申请人： SEN CORPORATION

发明人： Mitsuaki Kabasawa ,  Tatsuo Nishihara ,  Kazuhiro Watanabe ,  Yuuji Takahashi ,  Tatsuya Yamada

IPC分类号： H01J3/26

CPC分类号： H01J37/05 ,  H01J37/3171 ,  H01J2237/0473 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/15 ,  H01J2237/30472

摘要： A high-frequency acceleration type ion acceleration and transportation apparatus is a beamline after an ion beam is accelerated by a high-frequency acceleration system having an energy spread with respect to set beam energy and includes an energy analysis deflection electromagnet and a horizontal beam focusing element. In the ion acceleration and transportation apparatus, a double slit that is configured by an energy spread confining slit and an energy analysis slit is additionally disposed at a position at which energy dispersion and a beam size are to be appropriate. The position is determined based on a condition of the energy analysis deflection electromagnet and the horizontal beam focusing element, and the double slit performs energy separation and energy definition and decreases the energy spread of the ion beam by performing adjustment for a smaller energy spread while suppressing a decrease in the amount of a beam current.

摘要翻译： 高频加速型离子加速和输送装置是通过具有相对于设定束能量的能量扩散的高频加速系统加速离子束之后的束线，并且包括能量分析偏转电磁体和水平束聚焦元件 。 在离子加速输送装置中，在能量分散和光束尺寸适当的位置处，另外设置由能量扩散限制狭缝和能量分析狭缝构成的双狭缝。 基于能量分析偏转电磁体和水平光束聚焦元件的条件确定位置，并且双缝执行能量分离和能量定义，并且通过在抑制时能够进行更小的能量扩展的调整来减小离子束的能量扩展 光束电流量的减少。

公开(公告)号：US08878143B2

公开(公告)日：2014-11-04

申请号：US14349390

申请日：2012-09-27

申请人： Param Corporation

发明人： Hiroshi Yasuda

IPC分类号： H01J37/147 ,  H01J37/244 ,  H01J3/26 ,  G01J1/42 ,  H01J37/317 ,  H01J37/30

CPC分类号： H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31774

摘要： A high-accuracy and high-speed lithographic pattern is acquired by forming a square lattice matrix beam group with an interval which is an integral multiple of a beam size in a two-dimensional plane, switching on and off the mesh of a device to be drawn by a bitmap signal, forming a desired beam shape, deflecting the beam to a necessary position, and radiating a beam with a whole blanker being opened after the beam state is stabilized. On and off signals and a vector scan signal of each beam are provided, and the whole blanker is released after the beam is stabilized, and thus high-accuracy and high-speed lithography is performed with a small amount of data. When the total number of shots exceeds a constant value, the pattern data are modified and high-speed lithography is achieved. A semiconductor reversed bias p-n junction technique is preferably used for an individual blanker electrode.

摘要翻译： 通过以二维平面中的光束尺寸的整数倍的间隔形成方形的格子矩阵光束组来获取高精度和高速的光刻图案，将设备的网格打开和关闭为 通过位图信号绘制，形成期望的波束形状，将波束偏转到必要位置，并且在波束状态稳定之后，使整个消隐器辐射的光束被打开。 提供每个光束的开和关信号和矢量扫描信号，并且在光束稳定之后整个消隐器被释放，因此用少量数据执行高精度和高速光刻。 当总拍摄张数超过常数值时，图案数据被修改并实现高速光刻。 半导体反向偏压p-n结技术优选用于单个消隐电极。

公开(公告)号：US08835867B2

公开(公告)日：2014-09-16

申请号：US13741654

申请日：2013-01-15

申请人： Hermes-Microvision, Inc.

发明人： Zhongwei Chen ,  Weiming Ren ,  Xuedong Liu

IPC分类号： H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC分类号： H01J3/22 ,  B82Y10/00 ,  B82Y40/00 ,  H01F7/0205 ,  H01J3/20 ,  H01J37/14 ,  H01J37/3177 ,  H01J2237/1415 ,  H05K9/00

摘要： A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or second type PD units (called as hybrid PD unit as well) can be applied to cellular-type PD units to flexibly construct sub-lenses. Furthermore, magnetic shielding plates with a plurality of through openings can be placed above and/or below the multi-axis magnetic lens to make magnetic flux leaking out of the multi-axis magnetic lens vanish away rapidly outside the magnetic shielding plates.

摘要翻译： 提出了一种蜂窝型PD单元，并且多个蜂窝型PD单元成对地用于多轴磁性透镜中以聚焦多个带电波束。 可以将第一类PD单元或第二类PD单元（也称为混合PD单元）应用于蜂窝型PD单元以灵活地构建子透镜。 此外，具有多个通孔的磁屏蔽板可以放置在多轴磁性透镜的上方和/或下方，以使从多轴磁性透镜泄漏的磁通在磁屏蔽板之外快速消失。

公开(公告)号：US08822945B2

公开(公告)日：2014-09-02

申请号：US13065698

申请日：2011-03-28

申请人： Kenichi Nishinaka ,  Takashi Ogawa ,  Yoshihiro Koyama

发明人： Kenichi Nishinaka ,  Takashi Ogawa ,  Yoshihiro Koyama

IPC分类号： G01N23/225 ,  H01J49/42 ,  H01J3/26

CPC分类号： H01J37/08 ,  H01J37/265 ,  H01J2237/006 ,  H01J2237/0807 ,  H01J2237/0827

摘要： A focused ion beam apparatus includes a gas field ion gun unit having an emitter, an ion source gas supply unit for supplying different ion source gases to the emitter, a heater for heating the emitter, and an extraction electrode. A storage section stores, for each gas of a plurality of different types, set values of emitter temperature, gas pressure, extraction voltage to be applied to an extraction electrode, image contrast and image brightness. An input section selects and inputs one of the gas types. A control section reads, from the storage section, the set values of emitter temperature, gas pressure, extraction voltage, image contrast and image brightness, which correspond to the input gas type, and sets a heater, a gas control section, a voltage control section, and an adjustment section for the contrast and brightness of the image.

摘要翻译： 聚焦离子束装置包括具有发射极的气体场离子枪单元，用于向发射极供给不同离子源气体的离子源气体供给单元，用于加热发射极的加热器和提取电极。 对于多种不同类型的每种气体，存储部分存储要施加到提取电极的发射体温度，气体压力，提取电压的设定值，图像对比度和图像亮度。 输入部分选择并输入气体类型之一。 控制部从存储部读取与输入气体类型相对应的发射极温度，气体压力，提取电压，图像对比度和图像亮度的设定值，并且设定加热器，气体控制部，电压控制 部分和用于图像的对比度和亮度的调整部分。

公开(公告)号：US20140224997A1

公开(公告)日：2014-08-14

申请号：US14180350

申请日：2014-02-13

申请人： Industry-University Cooperation Foundation Sunmoon University

发明人： Tae Sik OH ,  Ho Seob KIM ,  Dae Wook KIM ,  Seung Joon AHN

IPC分类号： H01J3/26 ,  H01J3/14

CPC分类号： H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

摘要： An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

摘要翻译： 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。