Invention Grant
- Patent Title: Post-decel magnetic energy filter for ion implantation systems
- Patent Title (中): 用于离子注入系统的减速磁能过滤器
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Application No.: US12477631Application Date: 2009-06-03
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Publication No.: US08124946B2Publication Date: 2012-02-28
- Inventor: Geoffrey Ryding , Theodore Smick , Marvin Farley , Takao Sakase , Bo Vanderberg
- Applicant: Geoffrey Ryding , Theodore Smick , Marvin Farley , Takao Sakase , Bo Vanderberg
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies Inc.
- Current Assignee: Axcelis Technologies Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J49/30 ; H01J49/42

Abstract:
A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.
Public/Granted literature
- US20090321630A1 POST-DECEL MAGNETIC ENERGY FILTER FOR ION IMPLANTATION SYSTEMS Public/Granted day:2009-12-31
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