公开(公告)号：US08723452B2

公开(公告)日：2014-05-13

申请号：US13186513

申请日：2011-07-20

申请人： Geoffrey Ryding ,  Steven Richards ,  Paul Eide ,  Theodore H. Smick ,  Malcolm Barnett

发明人： Geoffrey Ryding ,  Steven Richards ,  Paul Eide ,  Theodore H. Smick ,  Malcolm Barnett

IPC分类号： H05H7/22

CPC分类号： H05H5/04

摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In an embodiment, direct connections are provided to gap electrodes from the stage points of a multistage Cockcroft Walton type voltage multiplier circuit. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.

摘要翻译： 广告。 C。 带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间 单独调节的间隙电压施加在每个相邻的加速器电极对之间。 在一个实施例中，从多级Cockcroft Walton型电压倍增器电路的级点向间隙电极提供直接连接。 所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

公开(公告)号：US07939812B2

公开(公告)日：2011-05-10

申请号：US12494272

申请日：2009-06-30

申请人： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick

发明人： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick

IPC分类号： H01J37/317 ,  H01J37/08 ,  H01J27/02 ,  H01J1/50

CPC分类号： H01J37/3171 ,  H01J37/08 ,  H01J2237/083

摘要： A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ion source may use core-less saddle type coils to provide a uniform field confining the plasma in the ion source. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon.

摘要翻译： 用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。 在一个实施例中，车轮的旋转轴线是固定的，并且带状的氢离子束被向下指向车轮的周缘。 带状束在轮上的晶片的整个径向宽度上延伸。 光束由离子源产生，提供具有至少100mm主横截面直径的抽出的带状束。 离子源可以使用无芯鞍型线圈来提供限制离子源中的等离子体的均匀场。 带状光束可以穿过将光束弯曲在色带平面中的90°弯曲磁体。

公开(公告)号：US20100181470A1

公开(公告)日：2010-07-22

申请号：US12357688

申请日：2009-01-22

申请人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

发明人： Marvin Farley ,  Donald Polner ,  Geoffrey Ryding ,  Theodore Smick ,  Takao Sakase ,  Ronald Horner ,  Edward Eisner ,  Paul Eide ,  Brian Freer ,  Mark Lambert ,  Donovan Beckel

IPC分类号： G01D18/00 ,  A61N5/00 ,  H01J5/18

CPC分类号： H01J37/244 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24542

摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.

摘要翻译： 一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。 一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与 第一梁部分。 光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。 板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

公开(公告)号：US20090321631A1

公开(公告)日：2009-12-31

申请号：US12487229

申请日：2009-06-18

申请人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

发明人： Theodore Smick ,  Geoffrey Ryding ,  Ronald F. Horner ,  Paul Eide ,  Marvin Farley ,  Kan Ota

IPC分类号： H01J49/26

CPC分类号： H01J37/3171 ,  F16M11/123 ,  F16M11/18 ,  H01J37/20 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20278

摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

摘要翻译： 提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。 可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。 机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。 每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。 每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

公开(公告)号：US07253424B2

公开(公告)日：2007-08-07

申请号：US11417027

申请日：2006-05-04

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： H01L21/26 ,  G21K5/10

CPC分类号： H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20050191409A1

公开(公告)日：2005-09-01

申请号：US11029004

申请日：2005-01-05

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Robert Mitchell ,  Theodore Smick ,  Geoffrey Ryding ,  Marvin Farley ,  Takao Sakase

IPC分类号： H01L21/265 ,  B05D1/00 ,  C23C14/00 ,  C23C16/00 ,  H01J27/00 ,  H01J37/244 ,  H01J37/304 ,  H01J37/317 ,  H01L21/425 ,  H01L21/66

CPC分类号： H01J37/3171 ,  H01J37/304 ,  H01J2237/30455 ,  H01J2237/31703

摘要： This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.

摘要翻译： 本发明涉及用于离子注入机的离子束监测装置，其中期望监测用于植入的离子束的通量和/或横截面轮廓。 通常期望在离子注入机中测量离子束的通量和/或横截面轮廓，以便改进对半导体晶片或类似物的离子注入的控制。 本发明描述了适配晶片保持器以允许执行这种光束轮廓。 衬底保持器可以逐渐地用于从下游通量监视器闭塞离子束，或者通量监视器可以位于设置有狭缝入口孔的晶片保持器上。

公开(公告)号：US06878946B2

公开(公告)日：2005-04-12

申请号：US10259827

申请日：2002-09-30

申请人： Marvin Farley ,  Takao Sakase ,  Shu Satoh ,  Geoffrey Ryding ,  Peter Rose ,  Christos Christou

发明人： Marvin Farley ,  Takao Sakase ,  Shu Satoh ,  Geoffrey Ryding ,  Peter Rose ,  Christos Christou

IPC分类号： H01J27/00 ,  H01J37/08

CPC分类号： H01J37/08 ,  H01J1/20 ,  H01J1/26 ,  H01J27/08 ,  H01J37/3171 ,  H01J2237/061 ,  H01J2237/082

摘要： An indirectly heated button cathode for use in the ion source of an ion implanter has a button member formed of a slug piece mounted in a collar piece. The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly P+++ for subsequent acceleration for high energy implantation.

摘要翻译： 用于离子注入机的离子源的间接加热纽扣阴极具有由安装在轴环件中的塞片形成的纽扣件。 芯块与套环件绝热，使其能够在更高的温度下工作，从而使电子发射增强并集中在芯块的表面上。 lug lug piece piece piece。。。。。。。。。。 替代地，块塞可以是钽以提供较低的热离子功能。 在离子源中产生的浓缩等离子体有效地增强高电荷状态离子的产生，特别是用于高能量注入的后续加速的P +++。

公开(公告)号：US06864494B2

公开(公告)日：2005-03-08

申请号：US09956247

申请日：2001-09-20

申请人： Geoffrey Ryding

发明人： Geoffrey Ryding

IPC分类号： C23C14/48 ,  H01J37/317 ,  H01L21/265 ,  H01J37/20

CPC分类号： H01J37/3171 ,  H01J2237/20228

摘要： A force compensator is provided for a semiconductor processing apparatus having a moving member, in order to compensate for a fixed force on the moving member, such as gravity or atmospheric pressure. A vacuum and piston combination is connected between the movable member and a reaction point. One side of the piston is open to atmosphere and the other side defines an enclosed region which is evacuated. The cylinder is evacuated to a pressure which does not exceed 10% of ambient pressure during operation of the device, so that pressure changes in the low pressure region have minimal effect on the compensation force during movement of the movable member over its displacement range.

摘要翻译： 为具有移动构件的半导体处理装置提供力补偿器，以便补偿诸如重力或大气压力的移动构件上的固定力。 真空和活塞组合连接在可动件和反应点之间。 活塞的一侧对大气开放，另一侧限定了被抽空的封闭区域。 在操作装置的过程中，将气缸排空至不超过环境压力10％的压力，使得低压区域的压力变化对可移动部件在其位移范围内运动期间的补偿力影响最小。

公开(公告)号：US06515288B1

公开(公告)日：2003-02-04

申请号：US09527029

申请日：2000-03-16

申请人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

发明人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

IPC分类号： G01F2300

CPC分类号： F16C29/025 ,  F16C32/0603 ,  F16C32/0618 ,  F16C33/748 ,  F16C2300/62 ,  H01J37/18 ,  H01J2237/166 ,  H01J2237/2006 ,  H01J2237/31701

摘要： A vacuum bearing structure comprises a combination of a planar gas bearing with a differentially-pumped vacuum seal. The bearing surface and the vacuum seal surfaces are formed of a porous material divided into a first outer region through which bearing gas can percolate to provide support and an inner second region providing the vacuum seal. An exhaust groove separates the two regions so that bearing gas can flow to atmosphere. The resulting structure can operate at a lower fly height to reduce loading on the differentially-pumped vacuum seal. The structure is particularly useful for motion feedthroughs into vacuum processes such as ion implantation.

摘要翻译： 真空承载结构包括平面气体轴承与差动抽真空密封件的组合。 轴承表面和真空密封表面由被分成第一外部区域的多孔材料形成，轴承气体可以通过该第一外部区域渗透以提供支撑，以及提供真空密封的内部第二区域。 排气槽分离两个区域，使得轴承气体可以流到大气中。 所得到的结构可以在较低的飞行高度下操作以减少差动泵真空密封件上的负载。 该结构对于诸如离子注入的真空过程中的运动馈通特别有用。

公开(公告)号：US06323496B1

公开(公告)日：2001-11-27

申请号：US09293955

申请日：1999-04-19

申请人： Takao Sakase ,  Theodore H. Smick ,  Geoffrey Ryding

发明人： Takao Sakase ,  Theodore H. Smick ,  Geoffrey Ryding

IPC分类号： H01J37317

CPC分类号： F16C32/0662 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  H01J2237/166 ,  H01J2237/31701 ,  Y10S277/913 ,  Y10S277/927

摘要： A vacuum seal and fluid bearing apparatus for reducing the distortion of the bearing surfaces of a gas bearing is described. The apparatus includes a stator attached around an aperture in a vacuum housing and having a first planar fluid bearing surface. A movable member for closing the vacuum housing aperture having a second fluid bearing surface extending parallel to the first bearing surface is adapted to be supported spaced from the first bearing surface by a bearing fluid. A vacuum seal is provided between the movable member and the stator. In use, a force due to atmospheric pressure acts on the movable member in a direction normal to the bearing surfaces and a movable member includes a pressure relief structure to reduce any bending moment produced in the movable member by the force.

摘要翻译： 描述了用于减小气体轴承的支承表面的变形的真空密封和流体轴承装置。 该装置包括定子，其围绕真空壳体中的孔附接并且具有第一平面流体支承表面。 用于关闭具有平行于第一支承表面延伸的第二流体支承表面的真空容纳孔的可移动构件适于通过轴承流体与第一支承表面间隔开。 在可动构件和定子之间设置真空密封件。 在使用中，由于大气压而产生的力在垂直于支承面的方向作用在可动件上，并且可移动部件包括压力释放结构，以减少由该力产生的可动件中产生的任何弯矩。