Invention Grant
- Patent Title: Plasma generator and work processing apparatus provided with the same
- Patent Title (中): 等离子发生器和工作处理装置相同
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Application No.: US12310896Application Date: 2007-09-12
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Publication No.: US08128783B2Publication Date: 2012-03-06
- Inventor: Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
- Applicant: Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
- Applicant Address: US CA Santa Clara JP Wakayama
- Assignee: Amarante Technologies, Inc.,Saian Corporation
- Current Assignee: Amarante Technologies, Inc.,Saian Corporation
- Current Assignee Address: US CA Santa Clara JP Wakayama
- Agency: Jordan and Hamburg LLP
- Priority: JP2006-247863 20060913
- International Application: PCT/JP2007/068212 WO 20070912
- International Announcement: WO2008/032856 WO 20080320
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306 ; B23K9/00 ; B23K9/02 ; H01J17/26 ; H01J7/24 ; H05B31/26

Abstract:
A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
Public/Granted literature
- US20090200910A1 Plasma generator and work processing apparatus provided with the same Public/Granted day:2009-08-13
Information query
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