发明授权
- 专利标题: Plasma generator and work processing apparatus provided with the same
- 专利标题(中): 等离子发生器和工作处理装置相同
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申请号: US12310896申请日: 2007-09-12
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公开(公告)号: US08128783B2公开(公告)日: 2012-03-06
- 发明人: Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
- 申请人: Hidetaka Matsuuchi , Ryuichi Iwasaki , Hirofumi Mankawa , Shigeru Masuda , Masaaki Mike , Sang Hun Lee
- 申请人地址: US CA Santa Clara JP Wakayama
- 专利权人: Amarante Technologies, Inc.,Saian Corporation
- 当前专利权人: Amarante Technologies, Inc.,Saian Corporation
- 当前专利权人地址: US CA Santa Clara JP Wakayama
- 代理机构: Jordan and Hamburg LLP
- 优先权: JP2006-247863 20060913
- 国际申请: PCT/JP2007/068212 WO 20070912
- 国际公布: WO2008/032856 WO 20080320
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; C23F1/00 ; H01L21/306 ; B23K9/00 ; B23K9/02 ; H01J17/26 ; H01J7/24 ; H05B31/26
摘要:
A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
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