发明授权
US08133758B2 Method of fabricating phase-change memory device having TiC layer 有权
具有TiC层的相变存储器件的制造方法

Method of fabricating phase-change memory device having TiC layer
摘要:
Provided is a method of fabricating a phase-change memory device. The phase-change memory device includes a memory cell having a switching device and a phase change pattern. The method includes; forming a TiC layer on a contact electrically connecting the switching device using a plasma enhanced cyclic chemical vapor deposition (PE-cyclic CVD) process, patterning the TiC layer to form a lower electrode on the contact, and forming the phase-change pattern on the lower electrode.
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