Invention Grant
- Patent Title: Isotopically-enriched boron-containing compounds, and methods of making and using same
- Patent Title (中): 同位素富集的含硼化合物及其制备和使用方法
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Application No.: US12913721Application Date: 2010-10-27
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Publication No.: US08138071B2Publication Date: 2012-03-20
- Inventor: Robert Kaim , Joseph D. Sweeney , Oleg Byl , Sharad N. Yedave , Edward E. Jones , Peng Zou , Ying Tang , Barry Lewis Chambers , Richard S. Ray
- Applicant: Robert Kaim , Joseph D. Sweeney , Oleg Byl , Sharad N. Yedave , Edward E. Jones , Peng Zou , Ying Tang , Barry Lewis Chambers , Richard S. Ray
- Applicant Address: US CT Danbury
- Assignee: Advanced Technology Materials, Inc.
- Current Assignee: Advanced Technology Materials, Inc.
- Current Assignee Address: US CT Danbury
- Agency: Hultquist IP
- Agent Steven J. Hultquist; Rose Yaghmour
- Main IPC: H01L21/26
- IPC: H01L21/26 ; H01L21/42
Abstract:
An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.
Public/Granted literature
- US20110097882A1 ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MAKING AND USING SAME Public/Granted day:2011-04-28
Information query
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