Invention Grant
- Patent Title: Gallium nitride light emitting devices and methods of manufacturing the same
- Patent Title (中): 氮化镓发光器件及其制造方法
-
Application No.: US12662925Application Date: 2010-05-12
-
Publication No.: US08138510B2Publication Date: 2012-03-20
- Inventor: Young-jo Tak , Jun-youn Kim , Hyun-gi Hong , Jae-won Lee , Hyung-su Jeong
- Applicant: Young-jo Tak , Jun-youn Kim , Hyun-gi Hong , Jae-won Lee , Hyung-su Jeong
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2009-0113359 20091123
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/20 ; H01L33/24

Abstract:
A gallium nitride (GaN) light emitting device and a method of manufacturing the same are provided, the method including sequentially forming a buffer layer and a first nitride layer on a silicon substrate, and forming a plurality of patterns by dry etching the first nitride layer. Each pattern includes a pair of sidewalls facing each other. A reflective layer is deposited on the first nitride layer so that one sidewall of the pair is exposed by the reflective layer. An n-type nitride layer that covers the first nitride layer is formed by horizontally growing an n-type nitride from the exposed sidewall, and a GaN-based light emitting structure layer is formed on the n-type nitride layer.
Public/Granted literature
- US20110121330A1 Gallium nitride light emitting devices and methods of manufacturing the same Public/Granted day:2011-05-26
Information query
IPC分类: