发明授权
- 专利标题: Electrostatic discharge protection device and method of fabricating same
- 专利标题(中): 静电放电保护装置及其制造方法
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申请号: US12127946申请日: 2008-05-28
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公开(公告)号: US08138546B2公开(公告)日: 2012-03-20
- 发明人: Robert J. Gauthier, Jr. , Junjun Li , Souvick Mitra , Mahmoud A. Mousa , Christopher Stephen Putnam
- 申请人: Robert J. Gauthier, Jr. , Junjun Li , Souvick Mitra , Mahmoud A. Mousa , Christopher Stephen Putnam
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Schmeiser, Olsen & Watts
- 代理商 Anthony Canale
- 主分类号: H01L27/01
- IPC分类号: H01L27/01 ; H01L27/12 ; H01L31/0392
摘要:
A silicon control rectifier and an electrostatic discharge protection device of an integrated circuit including the silicon control rectifier. The silicon control rectifier includes a silicon body formed in a silicon layer in direct physical contact with a buried oxide layer of a silicon-on-insulator substrate, a top surface of the silicon layer defining a horizontal plane; and an anode of the silicon control rectifier formed in a first region of the silicon body and a cathode of the silicon control rectifier formed in an opposite second region of the silicon body, wherein a path of current flow between the anode and the cathode is only in a single horizontal direction parallel to the horizontal plane.
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