Invention Grant
- Patent Title: Machine vision technique for manufacturing semiconductor wafers
- Patent Title (中): 用于制造半导体晶片的机器视觉技术
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Application No.: US12113492Application Date: 2008-05-01
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Publication No.: US08139231B2Publication Date: 2012-03-20
- Inventor: John W. Schwab , Gang Liu , David J. Michael
- Applicant: John W. Schwab , Gang Liu , David J. Michael
- Applicant Address: US MA Natick
- Assignee: Cognex Corporation
- Current Assignee: Cognex Corporation
- Current Assignee Address: US MA Natick
- Agency: Quarles & Brady LLP
- Main IPC: G01B11/14
- IPC: G01B11/14

Abstract:
A vision system is provided to determine a positional relationship between a photovoltaic device wafer on a platen and a printing element, such as a printing screen, on a remote side of the photovoltaic device wafer from the platen. A source emits ultraviolet light along a path that is transverse to a longitudinal axis of an aperture through the platen, and a diffuser panel is located along that path. A reflector directs the light from the diffuser panel toward the aperture. A video camera is located along the longitudinal axis of the aperture and produces an image using light received from the platen aperture, wherein some of that received light was reflected by the wafer. A band-pass filter is placed in front of the camera to block ambient light. The use of diffused ultraviolet light enhances contrast in the image between the wafer and the printing element.
Public/Granted literature
- US20090274361A1 MACHINE VISION TECHNIQUE FOR MANUFACTURING SEMICONDUCTOR WAFERS Public/Granted day:2009-11-05
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