Direct illumination machine vision technique for processing semiconductor wafers
    1.
    发明授权
    Direct illumination machine vision technique for processing semiconductor wafers 有权
    用于处理半导体晶片的直接照明机器视觉技术

    公开(公告)号:US08189194B2

    公开(公告)日:2012-05-29

    申请号:US12209248

    申请日:2008-09-12

    IPC分类号: G01B11/00

    摘要: A vision system is provided to determine a positional relationship between a semiconductor wafer on a platen and an element on a processing machine, such as a printing screen, on a remote side of the semiconductor wafer from the platen. A source directs ultraviolet light through an aperture in the platen to illuminate the semiconductor wafer and cast a shadow onto the element adjacent an edge of the semiconductor wafer. A video camera produces an image using light received from the platen aperture, wherein some of that received light was reflected by the wafer. The edge of the semiconductor wafer in the image is well defined by a dark/light transition.

    摘要翻译: 提供了一种视觉系统,用于确定压板上的半导体晶片与半导体晶片的远离压纸台的诸如印刷屏幕的处理机器上的元件之间的位置关系。 光源通过压板中的孔引导紫外光照射半导体晶片并将阴影投射到与半导体晶片的边缘相邻的元件上。 摄像机使用从压板孔接收的光产生图像,其中一些所接收的光被晶片反射。 图像中的半导体晶片的边缘由暗/光转变很好地限定。

    DIRECT ILLUMINATION MACHINE VISION TECHNIQUE FOR PROCESSING SEMICONDUCTOR WAFERS
    2.
    发明申请
    DIRECT ILLUMINATION MACHINE VISION TECHNIQUE FOR PROCESSING SEMICONDUCTOR WAFERS 有权
    直接照明机器视觉技术处理半导体波形

    公开(公告)号:US20100065757A1

    公开(公告)日:2010-03-18

    申请号:US12209248

    申请日:2008-09-12

    IPC分类号: G01N23/00 G01B11/00 G02B27/30

    摘要: A vision system is provided to determine a positional relationship between a semiconductor wafer on a platen and an element on a processing machine, such as a printing screen, on a remote side of the semiconductor wafer from the platen. A source directs ultraviolet light through an aperture in the platen to illuminate the semiconductor wafer and cast a shadow onto the element adjacent an edge of the semiconductor wafer. A video camera produces an image using light received from the platen aperture, wherein some of that received light was reflected by the wafer. The edge of the semiconductor wafer in the image is well defined by a dark/light transition.

    摘要翻译: 提供了一种视觉系统,用于确定压板上的半导体晶片与半导体晶片的远离压纸台的诸如印刷屏幕的处理机器上的元件之间的位置关系。 光源通过压板中的孔引导紫外光照射半导体晶片并将阴影投射到与半导体晶片的边缘相邻的元件上。 摄像机使用从压板孔接收的光产生图像,其中一些所接收的光被晶片反射。 图像中的半导体晶片的边缘由暗/光转变很好地限定。

    Method and apparatus for forming bends in a selected sequence
    3.
    发明授权
    Method and apparatus for forming bends in a selected sequence 失效
    用于以所选序列形成弯曲的方法和装置

    公开(公告)号:US6003358A

    公开(公告)日:1999-12-21

    申请号:US740167

    申请日:1996-10-22

    IPC分类号: B21D7/00 B21D11/10 B21J11/00

    CPC分类号: B21D7/00 B21D11/10

    摘要: The present invention relates generally to bending a workpiece to form a desired configuration and, in particular, to a method and apparatus for forming bends "out of sequence," i.e., in a time sequence different from the spatial sequence of the bends on the workpiece. The apparatus of the present invention include a bending system for bending a workpiece and a positioning system for positioning the workpiece relative to a bending region so that bends can be formed in various locations across the bending region. By virtue of the disclosed structures, a series of bends can be formed on a workpiece at various locations within the bending region. Bends can be formed out sequence and without advancing the workpiece relative to the bending region.

    摘要翻译: 本发明一般涉及弯曲工件以形成期望的构造,特别是涉及用于形成“不合序”的弯曲的方法和装置,即在与工件上的弯曲的空间顺序不同的时间序列中 。 本发明的装置包括用于弯曲工件的弯曲系统和用于相对于弯曲区域定位工件的定位系统,使得能够在弯曲区域的不同位置形成弯曲部。 通过所公开的结构,可以在弯曲区域内的各个位置上的工件上形成一系列弯曲部。 可以顺序地形成弯曲并且不使工件相对于弯曲区域前进。

    Machine vision technique for manufacturing semiconductor wafers
    4.
    发明授权
    Machine vision technique for manufacturing semiconductor wafers 有权
    用于制造半导体晶片的机器视觉技术

    公开(公告)号:US08139231B2

    公开(公告)日:2012-03-20

    申请号:US12113492

    申请日:2008-05-01

    IPC分类号: G01B11/14

    摘要: A vision system is provided to determine a positional relationship between a photovoltaic device wafer on a platen and a printing element, such as a printing screen, on a remote side of the photovoltaic device wafer from the platen. A source emits ultraviolet light along a path that is transverse to a longitudinal axis of an aperture through the platen, and a diffuser panel is located along that path. A reflector directs the light from the diffuser panel toward the aperture. A video camera is located along the longitudinal axis of the aperture and produces an image using light received from the platen aperture, wherein some of that received light was reflected by the wafer. A band-pass filter is placed in front of the camera to block ambient light. The use of diffused ultraviolet light enhances contrast in the image between the wafer and the printing element.

    摘要翻译: 提供了一种视觉系统,用于确定平台上的光伏器件晶片与光伏器件晶片远离印版的远程侧的印刷元件(例如印刷丝网)之间的位置关系。 源沿着与穿过压板的孔的纵向轴线横向的路径发射紫外光,并且漫射板位于沿着该路径的位置。 反射器将来自扩散板的光引向光圈。 摄像机沿着孔的纵向轴线定位,并使用从压板孔接收的光产生图像,其中一些接收的光被晶片反射。 带通滤波器放置在相机的前面以阻挡环境光。 使用扩散的紫外光增强了晶片和印刷元件之间的图像的对比度。

    MACHINE VISION TECHNIQUE FOR MANUFACTURING SEMICONDUCTOR WAFERS
    5.
    发明申请
    MACHINE VISION TECHNIQUE FOR MANUFACTURING SEMICONDUCTOR WAFERS 有权
    制造半导体波长的机器视觉技术

    公开(公告)号:US20090274361A1

    公开(公告)日:2009-11-05

    申请号:US12113492

    申请日:2008-05-01

    IPC分类号: G06K9/00

    摘要: A vision system is provided to determine a positional relationship between a photovoltaic device wafer on a platen and a printing element, such as a printing screen, on a remote side of the photovoltaic device wafer from the platen. A source emits ultraviolet light along a path that is transverse to a longitudinal axis of an aperture through the platen, and a diffuser panel is located along that path. A reflector directs the light from the diffuser panel toward the aperture. A video camera is located along the longitudinal axis of the aperture and produces an image using light received from the platen aperture, wherein some of that received light was reflected by the wafer. A band-pass filter is placed in front of the camera to block ambient light. The use of diffused ultraviolet light enhances contrast in the image between the wafer and the printing element.

    摘要翻译: 提供了一种视觉系统,用于确定平台上的光伏器件晶片与光伏器件晶片远离印版的远程侧的印刷元件(例如印刷丝网)之间的位置关系。 源沿着与穿过压板的孔的纵向轴线横向的路径发射紫外光,并且漫射板位于沿着该路径的位置。 反射器将来自扩散板的光引向光圈。 摄像机沿着孔的纵向轴线定位,并使用从压板孔接收的光产生图像,其中一些接收的光被晶片反射。 带通滤波器放置在相机的前面以阻挡环境光。 使用扩散的紫外光增强了晶片和印刷元件之间的图像的对比度。