Invention Grant
- Patent Title: Displacement measurement apparatus for microstructure and displcement measurement method thereof
- Patent Title (中): 用于微结构和位移测量方法的位移测量装置
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Application No.: US12315742Application Date: 2008-12-05
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Publication No.: US08141426B2Publication Date: 2012-03-27
- Inventor: Naoki Ikeuchi , Hisashi Fujiwara , Masami Yakabe , Masato Hayashi
- Applicant: Naoki Ikeuchi , Hisashi Fujiwara , Masami Yakabe , Masato Hayashi
- Applicant Address: JP Minato-ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-ku
- Agency: Masuvalley & Partners
- Priority: JP2007-314451 20071205
- Main IPC: G01P15/125
- IPC: G01P15/125 ; G01P9/04 ; G01C19/56
Abstract:
A displacement measurement apparatus for a microstructure according to the present invention measures a displacement of the microstructure having a fixed portion electrode including a first electrode and a second electrode and a movable portion electrode located oppositely to the fixed portion electrode. A bias generating circuit applies a bias signal to between the first electrode and the movable portion electrode so that influence of a noise signal on a detection signal picked up from between the second electrode and the movable portion electrode may be reduced. A C/V converting circuit converts a capacitance change that is picked up from between the second electrode and the movable portion electrode into a voltage. A detecting circuit detects a displacement of the movable portion electrode based on the voltage.
Public/Granted literature
- US20090145230A1 Displacement Measurement apparatus for microstructure and displcement measurement method thereof Public/Granted day:2009-06-11
Information query
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