Invention Grant
- Patent Title: Device and method for large area lithography
- Patent Title (中): 大面积光刻设备及方法
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Application No.: US10581497Application Date: 2004-11-03
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Publication No.: US08147235B2Publication Date: 2012-04-03
- Inventor: Babak Heidari , Marc Beck
- Applicant: Babak Heidari , Marc Beck , Helena Eleonora Benedihta Riddargrip Beck, legal representative
- Applicant Address: SE Malmo
- Assignee: Obducat AB
- Current Assignee: Obducat AB
- Current Assignee Address: SE Malmo
- Agency: Renner, Otto, Boiselle & Sklar, LLP
- Priority: EP03445141 20031205
- International Application: PCT/EP2004/052769 WO 20041103
- International Announcement: WO2005/054948 WO 20050616
- Main IPC: A01J21/00
- IPC: A01J21/00

Abstract:
Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104; 105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.
Public/Granted literature
- US20070018362A1 Device and method for large area lithography Public/Granted day:2007-01-25
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