Invention Grant
- Patent Title: Wide area stamp for antireflective surface
- Patent Title (中): 用于抗反射表面的广域印章
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Application No.: US12500946Application Date: 2009-07-10
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Publication No.: US08147704B2Publication Date: 2012-04-03
- Inventor: Kwangyeol Lee
- Applicant: Kwangyeol Lee
- Applicant Address: KR Seoul
- Assignee: Korea University Research and Business Foundation
- Current Assignee: Korea University Research and Business Foundation
- Current Assignee Address: KR Seoul
- Agency: Workman Nydegger
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
Nanoimprint molds for molding a surface of a material are provided. A nanoimprint mold includes a body with a molding surface that is formed by shaped nanopillars. The nanopillars may be formed on a substrate and shaped by performing at least a first partial oxidation of the nanopillars and then removing at least a portion of the oxidized material. Once shaped, a hard substance is deposited on the nanopillars to begin forming the molding surface of the nanoimprint mold. The deposition of a hard substance is followed by the deposition of carbon nanotube on the hard substance and then the removal of the substrate and nanopillars from the molding surface.
Public/Granted literature
- US20110008484A1 WIDE AREA STAMP FOR ANTIREFLECTIVE SURFACE Public/Granted day:2011-01-13
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