发明授权
US08148727B2 Display device having oxide thin film transistor and fabrication method thereof 有权
具有氧化物薄膜晶体管的显示装置及其制造方法

Display device having oxide thin film transistor and fabrication method thereof
摘要:
A display device including an oxide thin film transistor (TFT) is disclosed. A nitride-based gate insulating layer of a gate pad area is etched when an oxide semiconductor layer of a pixel area is etched by using a half-tone mask, a metal layer is formed at a contact hole of the etched gate insulting layer, and then a passivation layer formed thereon is etched. Thus, an overhang of the passivation layer can be prevented from being generated when the gate insulating layer is etched, and accordingly, the fabrication process can be simplified.
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