发明授权
US08148727B2 Display device having oxide thin film transistor and fabrication method thereof
有权
具有氧化物薄膜晶体管的显示装置及其制造方法
- 专利标题: Display device having oxide thin film transistor and fabrication method thereof
- 专利标题(中): 具有氧化物薄膜晶体管的显示装置及其制造方法
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申请号: US13166478申请日: 2011-06-22
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公开(公告)号: US08148727B2公开(公告)日: 2012-04-03
- 发明人: Im-Kuk Kang , Dae-Won Kim
- 申请人: Im-Kuk Kang , Dae-Won Kim
- 申请人地址: KR Seoul
- 专利权人: LG Display Co., Ltd.
- 当前专利权人: LG Display Co., Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: Brinks Hofer Gilson & Lione
- 优先权: KR10-2009-0048778 20090602
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L31/036 ; H01L31/0376 ; H01L31/20
摘要:
A display device including an oxide thin film transistor (TFT) is disclosed. A nitride-based gate insulating layer of a gate pad area is etched when an oxide semiconductor layer of a pixel area is etched by using a half-tone mask, a metal layer is formed at a contact hole of the etched gate insulting layer, and then a passivation layer formed thereon is etched. Thus, an overhang of the passivation layer can be prevented from being generated when the gate insulating layer is etched, and accordingly, the fabrication process can be simplified.
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