发明授权
US08153836B2 Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
有权
倍半硅氧烷复合混合物，可水解硅烷化合物，制备方法，抗蚀剂组合物，图案化工艺和基材加工
- 专利标题： Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
- 专利标题（中）： 倍半硅氧烷复合混合物，可水解硅烷化合物，制备方法，抗蚀剂组合物，图案化工艺和基材加工
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申请号： US11860872申请日： 2007-09-25
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公开(公告)号： US08153836B2公开(公告)日： 2012-04-10
- 发明人: Mutsuo Nakashima , Yoshitaka Hamada , Katsuya Takemura , Kazumi Noda
- 申请人： Mutsuo Nakashima , Yoshitaka Hamada , Katsuya Takemura , Kazumi Noda
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Westerman, Hattori, Daniels & Adrian, LLP
- 优先权： JP2006-264623 20060928
- 主分类号： C08F7/21
- IPC分类号： C08F7/21 ; C08F7/08 ; G03F7/075
摘要：
In a mixture of silsesquioxane compounds comprising silsesquioxane units having a side chain including a direct bond between a silicon atom and a norbornane skeleton and having a degree of condensation of substantially 100%, a dimethylene chain of the norbornane skeleton remote from the silicon bonded side is substituted with at least one substituent group other than hydrogen, and an isomer having a bulkier substituent group on the dimethylene chain at an exo position is present in a higher proportion.
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