Invention Grant
- Patent Title: Resistive non-volatile memory device
- Patent Title (中): 电阻式非易失性存储器件
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Application No.: US11836593Application Date: 2007-08-09
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Publication No.: US08154003B2Publication Date: 2012-04-10
- Inventor: Tzyh-Cheang Lee , Fu-Liang Yang , Tseung-Yuen Tseng , Chih-Yang Lin
- Applicant: Tzyh-Cheang Lee , Fu-Liang Yang , Tseung-Yuen Tseng , Chih-Yang Lin
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
The present disclosure provides a memory cell. The memory cell includes a first electrode, a variable resistive material layer coupled to the first electrode, a metal oxide layer coupled the variable resistive material layer; and a second electrode coupled to the metal oxide layer. In an embodiment, the metal oxide layer provides a constant resistance.
Public/Granted literature
- US20090039332A1 RESISTIVE NON-VOLATILE MEMORY DEVICE Public/Granted day:2009-02-12
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