发明授权
US08154718B2 Apparatus and method for inspecting micro-structured devices on a semiconductor substrate
有权
用于检查半导体衬底上的微结构器件的装置和方法
- 专利标题: Apparatus and method for inspecting micro-structured devices on a semiconductor substrate
- 专利标题(中): 用于检查半导体衬底上的微结构器件的装置和方法
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申请号: US11568949申请日: 2005-05-23
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公开(公告)号: US08154718B2公开(公告)日: 2012-04-10
- 发明人: Uwe Graf , Lambert Danner
- 申请人: Uwe Graf , Lambert Danner
- 申请人地址: DE Wetzlar
- 专利权人: Vistec Semiconductor Systems GmbH
- 当前专利权人: Vistec Semiconductor Systems GmbH
- 当前专利权人地址: DE Wetzlar
- 代理机构: Houston Eliseeva, LLP
- 优先权: DE102004029212 20040616
- 国际申请: PCT/EP2005/052351 WO 20050523
- 国际公布: WO2005/124422 WO 20051229
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
Previously used examination devices and methods mostly operate with reflected visible or UV light to analyze microstructured samples of a wafer (38), for example. The aim of the invention is to increase the possible uses of said devices, i.e. particularly in order to represent structural details, e.g. of wafers that are structured on both sides, which are not visible in VIS or UV because coatings or intermediate materials are not transparent. Said aim is achieved by using IR light as reflected light while creating transillumination (52) which significantly improves contrast in the IR image, among other things, thus allowing the sample to be simultaneously represented in reflected or transmitted IR light and in reflected visible light.
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