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US08162584B2 Method and apparatus for semiconductor wafer alignment 有权
用于半导体晶片对准的方法和装置

Method and apparatus for semiconductor wafer alignment
Abstract:
The invention provides, in some aspects, a wafer alignment system comprising an image acquisition device, an illumination source, a rotatable wafer platform, and an image processor that includes functionality for mapping coordinates in an image of an article (such as a wafer) on the platform to a “world” frame of reference at each of a plurality of angles of rotation of the platform.
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