Invention Grant
- Patent Title: Method and apparatus for semiconductor wafer alignment
- Patent Title (中): 用于半导体晶片对准的方法和装置
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Application No.: US11508551Application Date: 2006-08-23
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Publication No.: US08162584B2Publication Date: 2012-04-24
- Inventor: David J. Michael , James Clark , Gang Liu
- Applicant: David J. Michael , James Clark , Gang Liu
- Applicant Address: US MA Natick
- Assignee: Cognex Corporation
- Current Assignee: Cognex Corporation
- Current Assignee Address: US MA Natick
- Agent David J. Powsner
- Main IPC: G06K9/00
- IPC: G06K9/00 ; H01L21/677

Abstract:
The invention provides, in some aspects, a wafer alignment system comprising an image acquisition device, an illumination source, a rotatable wafer platform, and an image processor that includes functionality for mapping coordinates in an image of an article (such as a wafer) on the platform to a “world” frame of reference at each of a plurality of angles of rotation of the platform.
Public/Granted literature
- US20080050006A1 Method and apparatus for semiconductor wafer alignment Public/Granted day:2008-02-28
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