发明授权
- 专利标题: Semiconductor device with hetero semiconductor region and method of manufacturing the same
- 专利标题(中): 具有异质半导体区域的半导体器件及其制造方法
-
申请号: US12065847申请日: 2006-08-22
-
公开(公告)号: US08164116B2公开(公告)日: 2012-04-24
- 发明人: Tetsuya Hayashi , Yoshio Shimoida , Masakatsu Hoshi , Hideaki Tanaka , Shigeharu Yamagami
- 申请人: Tetsuya Hayashi , Yoshio Shimoida , Masakatsu Hoshi , Hideaki Tanaka , Shigeharu Yamagami
- 申请人地址: JP Yokohama-shi
- 专利权人: Nissan Motor Co., Ltd.
- 当前专利权人: Nissan Motor Co., Ltd.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Foley & Lardner LLP
- 优先权: JP2005-263313 20050912; JP2006-122197 20060426; JP2006-136144 20060516
- 国际申请: PCT/JP2006/316806 WO 20060822
- 国际公布: WO2007/032197 WO 20070322
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A semiconductor device includes: a semiconductor base; a hetero semiconductor region which is in contact with the semiconductor base and which has a band gap different from that of the semiconductor base; a first electrode connected to the hetero semiconductor region; and a second electrode forming an ohmic contact to the semiconductor base. The hetero semiconductor region includes a laminated hetero semiconductor region formed by laminating a plurality of semiconductor layers in which crystal alignment is discontinuous at a boundary between at least two layers.
公开/授权文献
信息查询
IPC分类: