发明授权
- 专利标题: Film-forming apparatus and film-forming method
- 专利标题(中): 成膜装置及成膜方法
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申请号: US10417139申请日: 2003-04-17
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公开(公告)号: US08168001B2公开(公告)日: 2012-05-01
- 发明人: Hiroto Uchida , Takehito Jinbo , Takeshi Masuda , Masahiko Kajinuma , Takakazu Yamada , Masaki Uematsu , Koukou Suu , Isao Kimura
- 申请人: Hiroto Uchida , Takehito Jinbo , Takeshi Masuda , Masahiko Kajinuma , Takakazu Yamada , Masaki Uematsu , Koukou Suu , Isao Kimura
- 申请人地址: JP Kanagawa
- 专利权人: Ulvac, Inc.
- 当前专利权人: Ulvac, Inc.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Arent Fox LLP
- 优先权: JP2002-117123 20020419; JP2002-243507 20020823
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; C23C16/455 ; H01L21/306
摘要:
Film-forming apparatus including a film-forming vacuum chamber having a stage for a substrate, a chamber for mixing gas comprising a raw gas and a reactive gas connected to the film-forming chamber, a chamber for vaporizing the raw material, and a gas head for introducing the mixed gas into the film-forming chamber, disposed on the upper face of the film-forming chamber and opposed to the stage. Particle traps with controllable temperatures are positioned between the vaporization chamber and the mixing chamber and on the downstream side of the mixing chamber. When forming a thin film with the apparatus, a reactive gas and/or a carrier gas are passed through the film-forming chamber while opening a valve in a by-pass line, connecting the primary side to the secondary side of the particle trap arranged at the downstream side of the mixing chamber. The valve is then closed and the film-forming operation is initiated.
公开/授权文献
- US20030198741A1 Film-forming apparatus and film-forming method 公开/授权日:2003-10-23
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