发明授权
- 专利标题: Polishing system having a track
- 专利标题(中): 具有轨道的抛光系统
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申请号: US12420996申请日: 2009-04-09
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公开(公告)号: US08172643B2公开(公告)日: 2012-05-08
- 发明人: Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
- 申请人: Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson & Sheridan, LLP
- 主分类号: B24B49/00
- IPC分类号: B24B49/00 ; B24B5/00
摘要:
Embodiments described herein relate to a track system in a polishing system. One embodiment described herein provides a track system configured to transfer polishing heads in a polishing system. The track system comprises a supporting frame, a track coupled to the supporting frame and defining a path along which the polishing heads are configured to move, and one or more carriages configured to carry at least one polishing head along the path defined by the track, wherein the one or more carriages are coupled to the track and independently movable along the track.
公开/授权文献
- US20090258574A1 POLISHING SYSTEM HAVING A TRACK 公开/授权日:2009-10-15
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