Invention Grant
- Patent Title: Photosensitive resin composition
- Patent Title (中): 感光树脂组合物
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Application No.: US12714837Application Date: 2010-03-01
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Publication No.: US08173729B2Publication Date: 2012-05-08
- Inventor: Hyoc-min Youn , Byung-uk Kim , Ki-hyuk Koo , Tae-hoon Yeo , Joo-pyo Yun , Hong-dae Shin , Sang Hoon Lee , Dong-myung Kim , Su-youn Choi , Jin Sun Kim , Chang-Min Woo , Hong-Suk Kim
- Applicant: Hyoc-min Youn , Byung-uk Kim , Ki-hyuk Koo , Tae-hoon Yeo , Joo-pyo Yun , Hong-dae Shin , Sang Hoon Lee , Dong-myung Kim , Su-youn Choi , Jin Sun Kim , Chang-Min Woo , Hong-Suk Kim
- Applicant Address: KR
- Assignee: Dongjin Semichem Co., Ltd.
- Current Assignee: Dongjin Semichem Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2009-0017696 20090302
- Main IPC: C08K5/3447
- IPC: C08K5/3447 ; C08K5/3492 ; C08K5/3435
Abstract:
The present invention relates to a photosensitive resin composition, particularly to a photosensitive resin composition for forming an interlayer organic insulating film for TFT-LCD, comprising 0.01 to 20 wt % of UV stabilizer or radical scavenger. The photosensitive resin composition of the present invention can be used for forming an interlayer organic insulating film for TFT-LCD to improve active unfilled area upon over exposure in liquid crystal photo-alignment process, can easily control resolution of pattern, and is particularly suitable for forming a planarization layer of an interlayer organic insulating film.
Public/Granted literature
- US20100222473A1 PHOTOSENSITIVE RESIN COMPOSITION Public/Granted day:2010-09-02
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