Invention Grant
- Patent Title: High voltage LDMOS transistor
- Patent Title (中): 高压LDMOS晶体管
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Application No.: US12114439Application Date: 2008-05-02
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Publication No.: US08174071B2Publication Date: 2012-05-08
- Inventor: William Wei-Yuan Tien , Chao-Wei Tseng , Fu-Hsin Chen
- Applicant: William Wei-Yuan Tien , Chao-Wei Tseng , Fu-Hsin Chen
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
An LDMOS transistor structure and methods of making the same are provided. The structure includes a gate electrode extended on an upper boundary of an extension dielectric region that separates the gate electrode from the drain region of the LDMOS transistor. Moreover, at an area close to an edge of the extended gate electrode portion, the gate electrode further projects downwards into a convex-shaped recess or groove in the upper boundary of the extension dielectric region, forming a tongue. LDMOS transistors with this structure may provide improved suppression of hot carrier effects.
Public/Granted literature
- US20090273029A1 High Voltage LDMOS Transistor and Method Public/Granted day:2009-11-05
Information query
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