发明授权
- 专利标题： Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device
- 专利标题（中）： 液浸式光学工具，液浸式光学工具的清洗方法，液浸式曝光方法及半导体装置的制造方法
-
申请号： US12510009申请日： 2009-07-27
-
公开(公告)号： US08174669B2公开(公告)日： 2012-05-08
- 发明人: Tatsuhiko Higashiki , Hiroshi Tomita
- 申请人： Tatsuhiko Higashiki , Hiroshi Tomita
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2004-258676 20040906
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.
公开/授权文献
信息查询
