公开(公告)号：US08174669B2

公开(公告)日：2012-05-08

申请号：US12510009

申请日：2009-07-27

申请人： Tatsuhiko Higashiki ,  Hiroshi Tomita

发明人： Tatsuhiko Higashiki ,  Hiroshi Tomita

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G02B27/0006 ,  G03F7/70341 ,  G03F7/70925

摘要： There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.

摘要翻译： 公开了一种液浸光学工具，其包括光源，光学透镜系统，移动待放置物体的物体基座的台，包括浸液介质流体供应装置的头部和液体 浸没介质流体排出装置，以在光学透镜系统和物体之间提供液浸介质流体层，限制液浸介质流体层的区域的栅栏，以及清洁与已经接触的部分的清洁装置 液体介质流体通过清洗溶液。

公开(公告)号：US20090284718A1

公开(公告)日：2009-11-19

申请号：US12510009

申请日：2009-07-27

申请人： Tatsuhiko Higashiki ,  Hiroshi Tomita

发明人： Tatsuhiko Higashiki ,  Hiroshi Tomita

IPC分类号： G03B27/52

CPC分类号： G02B27/0006 ,  G03F7/70341 ,  G03F7/70925

摘要： There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.

摘要翻译： 公开了一种液浸光学工具，其包括光源，光学透镜系统，移动待放置物体的物体基座的台，包括浸液介质流体供应装置的头部和液体 浸没介质流体排出装置，以在光学透镜系统和物体之间提供液浸介质流体层，限制液浸介质流体层的区域的栅栏，以及清洁与已经接触的部分的清洁装置 液体介质流体通过清洗溶液。

公开(公告)号：US20070039637A1

公开(公告)日：2007-02-22

申请号：US11504053

申请日：2006-08-15

申请人： Tatsuhiko Higashiki ,  Hiroshi Tomita

发明人： Tatsuhiko Higashiki ,  Hiroshi Tomita

IPC分类号： B08B3/08 ,  H01L21/66

CPC分类号： G02B27/0006 ,  G03F7/70341 ,  G03F7/70925

摘要： There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.

摘要翻译： 公开了一种液浸光学工具，其包括光源，光学透镜系统，移动待放置物体的物体基座的台，包括浸液介质流体供应装置的头部和液体 浸没介质流体排出装置，以在光学透镜系统和物体之间提供液浸介质流体层，限制液浸介质流体层的区域的栅栏，以及清洁与已经接触的部分的清洁装置 液体介质流体通过清洗溶液。

公开(公告)号：US10199240B2

公开(公告)日：2019-02-05

申请号：US13482318

申请日：2012-05-29

申请人： Hidekazu Hayashi ,  Yohei Sato ,  Hisashi Okuchi ,  Hiroshi Tomita ,  Kazuyuki Mitsuoka ,  Mitsuaki Iwashita ,  Takehiko Orii ,  Gen You ,  Hiroki Ohno ,  Takayuki Toshima

发明人： Hidekazu Hayashi ,  Yohei Sato ,  Hisashi Okuchi ,  Hiroshi Tomita ,  Kazuyuki Mitsuoka ,  Mitsuaki Iwashita ,  Takehiko Orii ,  Gen You ,  Hiroki Ohno ,  Takayuki Toshima

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B7/00

摘要： A substrate processing method and apparatus which can remove an anti-drying liquid, which has entered a three-dimensional pattern with recessed portions formed in a substrate, in a relatively short time. The substrate processing method includes the steps of: carrying a substrate, having a three-dimensional pattern formed in a surface, into a processing container, said pattern being covered with an anti-drying liquid that has entered the recessed portions of the pattern; heating the substrate and supplying a pressurizing gas or a fluid in a high-pressure state into the processing container, thereby forming a high-pressure atmosphere in the processing container before the anti-drying liquid vaporizes to such an extent as to cause pattern collapse and bringing the anti-drying liquid into a high-pressure state while keeping the liquid in the recessed portions of the pattern; and thereafter discharging a fluid in a high-pressure state or a gaseous state from the processing container.

公开(公告)号：US09126229B2

公开(公告)日：2015-09-08

申请号：US14116952

申请日：2012-05-10

申请人： Shigeru Tahara ,  Eiichi Nishimura ,  Hiroshi Tomita ,  Tokuhisa Ohiwa ,  Hisashi Okuchi ,  Mitsuhiro Omura

发明人： Shigeru Tahara ,  Eiichi Nishimura ,  Hiroshi Tomita ,  Tokuhisa Ohiwa ,  Hisashi Okuchi ,  Mitsuhiro Omura

IPC分类号： B05D3/14 ,  H01L21/02 ,  H01L21/311

CPC分类号： B05D3/145 ,  H01L21/02057 ,  H01L21/02063 ,  H01L21/31116

摘要： A deposit removal method for removing deposits deposited on the surface of a pattern formed on a substrate by etching, includes an oxygen plasma treatment process for exposing the substrate to oxygen plasma while heating the substrate and a cycle treatment process for, after the oxygen plasma treatment process, repeating multiple cycles of a first period and a second period. In the first period, the substrate is exposed to a mixture of hydrogen fluoride gas and alcohol gas inside a processing chamber and the partial pressure of the alcohol gas is set to the first partial pressure. In the second period, the partial pressure of the alcohol gas is set to the second partial pressure lower than the first partial pressure by exhausting the inside of the processing chamber.

摘要翻译： 通过蚀刻去除沉积在形成在基板上的图案的表面上的沉积物的沉积物去除方法包括用于在加热基板的同时将基板暴露于氧等离子体的氧等离子体处理工艺和在氧等离子体处理之后的循环处理 处理，重复第一周期和第二周期的多个周期。 在第一阶段中，将基板暴露于处理室内的氟化氢气体和醇气体的混合物，并将醇气体的分压设定为第一分压。 在第二时段，通过排出处理室的内部，将醇气体的分压设定为低于第一分压的第二分压。

公开(公告)号：US08772164B2

公开(公告)日：2014-07-08

申请号：US13526216

申请日：2012-06-18

申请人： Yasuhito Yoshimizu ,  Satoshi Wakatsuki ,  Hisashi Okuchi ,  Atsuko Sakata ,  Hiroshi Tomita

发明人： Yasuhito Yoshimizu ,  Satoshi Wakatsuki ,  Hisashi Okuchi ,  Atsuko Sakata ,  Hiroshi Tomita

IPC分类号： H01L21/44

CPC分类号： C23C18/1608 ,  C23C18/1893 ,  C23C18/32 ,  H01L21/4846 ,  H01L21/76874 ,  H01L21/76879 ,  H01L21/76885 ,  H01L28/91

摘要： According to one embodiment, a method for forming an interconnection pattern includes forming an insulating pattern, forming a self-assembled film, and forming a conductive layer. The insulating pattern has a side surface on a major surface of a matrix. The self-assembled film has an affinity with a material of the insulating pattern on the side surface of the insulating pattern. The forming the conductive layer includes depositing a conductive material on a side surface of the self-assembled film.

摘要翻译： 根据一个实施例，用于形成互连图案的方法包括形成绝缘图案，形成自组装膜并形成导电层。 绝缘图案在矩阵的主表面上具有侧表面。 自组装膜与绝缘图案的侧面上的绝缘图案的材料具有亲和性。 形成导电层包括在自组装膜的侧表面上沉积导电材料。

公开(公告)号：US08375964B2

公开(公告)日：2013-02-19

申请号：US12560210

申请日：2009-09-15

申请人： Hiroshi Tomita ,  Hisashi Okuchi ,  Minako Inukai

发明人： Hiroshi Tomita ,  Hisashi Okuchi ,  Minako Inukai

IPC分类号： B08B3/02

CPC分类号： B08B3/08 ,  B08B13/00 ,  H01L21/67051 ,  H01L21/67748 ,  H01L21/68707 ,  H01L21/68728

摘要： A template cleaning method for cleaning a template for nanoimprint, according to an embodiment of the present invention includes placing a wafer on a stage provided in a chamber, cleaning the wafer placed on the stage, inspecting the wafer for particles after the cleaning of the wafer, placing the template on the stage after the inspection of the wafer, and cleaning the template placed on the stage.

摘要翻译： 根据本发明的实施例的用于清洁纳米压印模板的模板清洁方法包括将晶片放置在设置在室中的台上，清洁放置在台上的晶片，在晶片清洁之后检查晶片的颗粒 ，在检查晶片后将模板放置在平台上，并清洁放置在平台上的模板。

公开(公告)号：US20130019905A1

公开(公告)日：2013-01-24

申请号：US13420870

申请日：2012-03-15

申请人： Linan JI ,  Hidekazu Hayashi ,  Hiroshi Tomita ,  Hisashi Okuchi ,  Yohei Sato ,  Takayuki Toshima ,  Mitsuaki Iwashita ,  Kazuyuki Mitsuoka ,  Gen You ,  Hiroki Ohno ,  Takehiko Orii

发明人： Linan JI ,  Hidekazu Hayashi ,  Hiroshi Tomita ,  Hisashi Okuchi ,  Yohei Sato ,  Takayuki Toshima ,  Mitsuaki Iwashita ,  Kazuyuki Mitsuoka ,  Gen You ,  Hiroki Ohno ,  Takehiko Orii

IPC分类号： B08B3/10 ,  F26B3/00

CPC分类号： H01L21/02 ,  F26B21/10 ,  F26B21/14 ,  F26B23/028 ,  F26B2200/04 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/02101 ,  H01L21/67034

摘要： According to one embodiment, a supercritical drying method for a semiconductor substrate, comprises introducing the semiconductor substrate into a chamber in a state, a surface of the semiconductor substrate being wet with alcohol, substituting the alcohol on the semiconductor substrate with a supercritical fluid of carbon dioxide by impregnating the semiconductor substrate to the supercritical fluid in the chamber, and discharging the supercritical fluid and the alcohol from the chamber and reducing a pressure inside the chamber. The method further comprises performing a baking treatment by supplying an oxygen gas or an ozone gas to the chamber after the reduction of the pressure inside the chamber.

摘要翻译： 根据一个实施方案，一种用于半导体衬底的超临界干燥方法包括将半导体衬底以一种状态将半导体衬底引入室中，该半导体衬底的表面被醇润湿，用半导体衬底上的醇代替超临界流体碳 通过将半导体衬底浸渍到腔室中的超临界流体中，并且将超临界流体和醇从腔室排出并且减小腔室内的压力，从而将二氧化碳稀释。 该方法还包括在减小室内的压力之后，通过向室内供应氧气或臭氧气体进行烘烤处理。

公开(公告)号：US20120304485A1

公开(公告)日：2012-12-06

申请号：US13482318

申请日：2012-05-29

申请人： Hidekazu Hayashi ,  Yohei Sato ,  Hisashi Okuchi ,  Hiroshi Tomita ,  Kazuyuki Mitsuoka ,  Mitsuaki Iwashita ,  Takehiko Orii ,  Gen You ,  Hiroki Ohno ,  Takayuki Toshima

发明人： Hidekazu Hayashi ,  Yohei Sato ,  Hisashi Okuchi ,  Hiroshi Tomita ,  Kazuyuki Mitsuoka ,  Mitsuaki Iwashita ,  Takehiko Orii ,  Gen You ,  Hiroki Ohno ,  Takayuki Toshima

IPC分类号： F26B7/00

CPC分类号： H01L21/67028 ,  B08B7/0021 ,  H01L21/02057 ,  H01L21/02101

摘要： A substrate processing method and apparatus which can remove an anti-drying liquid, which has entered a three-dimensional pattern with recessed portions formed in a substrate, in a relatively short time. The substrate processing method includes the steps of: carrying a substrate, having a three-dimensional pattern formed in a surface, into a processing container, said pattern being covered with an anti-drying liquid that has entered the recessed portions of the pattern; heating the substrate and supplying a pressurizing gas or a fluid in a high-pressure state into the processing container, thereby forming a high-pressure atmosphere in the processing container before the anti-drying liquid vaporizes to such an extent as to cause pattern collapse and bringing the anti-drying liquid into a high-pressure state while keeping the liquid in the recessed portions of the pattern; and thereafter discharging a fluid in a high-pressure state or a gaseous state from the processing container.

摘要翻译： 一种基板处理方法和装置，其能够在相当短的时间内去除已经进入具有形成在基板中的凹部的三维图案的抗干燥液体。 基板处理方法包括以下步骤：将具有形成在表面上的三维图案的基板运送到处理容器中，所述图案被已经进入图案的凹部的防干燥液体覆盖; 加热基板并将高压状态的加压气体或流体供给到处理容器中，从而在防干燥液体蒸发之前在处理容器中形成高压气氛，使其形成图案塌陷， 将防干燥液体保持在高压状态，同时将液体保持在图案的凹部中; 然后从处理容器中排出处于高压状态或气态的流体。

公开(公告)号：US20120240426A1

公开(公告)日：2012-09-27

申请号：US13231956

申请日：2011-09-13

申请人： Hidekazu HAYASHI ,  Hiroshi Tomita ,  Yukiko Kitajima ,  Hisashi Okuchi ,  Yohei Sato

发明人： Hidekazu HAYASHI ,  Hiroshi Tomita ,  Yukiko Kitajima ,  Hisashi Okuchi ,  Yohei Sato

IPC分类号： F26B7/00 ,  F26B21/14

CPC分类号： H01L21/02101 ,  H01L21/02068 ,  H01L21/67017 ,  H01L21/67034

摘要： According to one embodiment, a supercritical drying method for a semiconductor substrate includes introducing a semiconductor substrate formed with a metal film into a chamber, the surface of the substrate being wet with alcohol, supplying a supercritical fluid of carbon dioxide into the chamber, setting a temperature inside the chamber to a predetermined temperature, to replace the alcohol on the semiconductor substrate with the supercritical fluid, and discharging the supercritical fluid and the alcohol from the chamber while keeping the temperature inside the chamber at the predetermined temperature, to lower a pressure inside the chamber. The predetermined temperature is not lower than 75° C. but lower than a critical temperature of the alcohol.

摘要翻译： 根据一个实施例，半导体衬底的超临界干燥方法包括将形成有金属膜的半导体衬底引入腔室中，基底表面被醇润湿，将二氧化碳的超临界流体供应到腔室中， 在室内温度达到预定温度，用超临界流体替代半导体衬底上的醇，并且将超临界流体和醇从室中排出，同时将室内的温度保持在预定温度，以降低内部的压力 房间。 预定温度不低于75℃，但低于醇的临界温度。