发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US12230979申请日： 2008-09-09
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公开(公告)号： US08174674B2公开(公告)日： 2012-05-08
- 发明人: Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
- 申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
- 申请人地址： NL Veldhoven DE Oberkochen
- 专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人地址： NL Veldhoven DE Oberkochen
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03256499 20031015
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/32
摘要：
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
公开/授权文献
- US20090021707A1 Lithographic apparatus and device manufacturing method 公开/授权日：2009-01-22
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