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公开(公告)号：US07545481B2
公开(公告)日：2009-06-09
申请号：US10719683
申请日：2003-11-24
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
摘要翻译： 投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。 关节可以做温暖还是冷。 焊料，胶水和胶水保护都可用于形成这种接头。 在一个实施例中，元件及其支撑由石英制成。
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公开(公告)号：US08174674B2
公开(公告)日：2012-05-08
申请号：US12230979
申请日：2008-09-09
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译： 浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学性质。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。
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公开(公告)号：US08472006B2
公开(公告)日：2013-06-25
申请号：US12463242
申请日：2009-05-08
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
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公开(公告)号：US20120194790A1
公开(公告)日：2012-08-02
申请号：US13446687
申请日：2012-04-13
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译： 浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学特性。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。
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公开(公告)号：US20090021707A1
公开(公告)日：2009-01-22
申请号：US12230979
申请日：2008-09-09
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译： 浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学特性。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。
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公开(公告)号：US08570486B2
公开(公告)日：2013-10-29
申请号：US13446687
申请日：2012-04-13
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
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公开(公告)号：US07433015B2
公开(公告)日：2008-10-07
申请号：US10961369
申请日：2004-10-12
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译： 浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学特性。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。
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公开(公告)号：US08724084B2
公开(公告)日：2014-05-13
申请号：US13189255
申请日：2011-07-22
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20090207397A1
公开(公告)日：2009-08-20
申请号：US12411952
申请日：2009-03-26
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。
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公开(公告)号：US08964164B2
公开(公告)日：2015-02-24
申请号：US13188026
申请日：2011-07-21
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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