Invention Grant
- Patent Title: Porous inorganic materials of silcon and oxygen
- Patent Title (中): 硅氧烷和氧气的多孔无机材料
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Application No.: US12536522Application Date: 2009-08-06
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Publication No.: US08177901B2Publication Date: 2012-05-15
- Inventor: Patrice Bujard , Andreas Mühlebach , Paul Adriaan Van Der Schaaf
- Applicant: Patrice Bujard , Andreas Mühlebach , Paul Adriaan Van Der Schaaf
- Applicant Address: DE
- Assignee: BASF SE Ludwigshafen
- Current Assignee: BASF SE Ludwigshafen
- Current Assignee Address: DE
- Agent Shiela A. Loggins
- Priority: EP03405017 20030117; EP03100548 20030306; WOPCT/EP03/50229 20030616
- Main IPC: C04B14/00
- IPC: C04B14/00 ; C04B14/04 ; C23C16/00 ; B01F3/12 ; C01B33/14
Abstract:
The present invention relates to a process for the production of porous inorganic materials or a matrix material containing nanoparticles with high uniformity of thickness and/or high effective surface area and to the materials obtainable by this process. By the above-mentioned process materials with a defined thickness in the region of ±10%, preferably ±5% of the average thickness are available.
Public/Granted literature
- US20100003520A1 POROUS INORGANIC MATERIALS OF SILCON AND OXYGEN Public/Granted day:2010-01-07
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