发明授权
- 专利标题: Vertical nitride semiconductor light emitting diode and method of manufacturing the same
- 专利标题(中): 垂直氮化物半导体发光二极管及其制造方法
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申请号: US12909297申请日: 2010-10-21
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公开(公告)号: US08198114B2公开(公告)日: 2012-06-12
- 发明人: Sang Ho Yoon , Su Yeol Lee , Doo Go Baik , Seok Beom Choi , Tae Sung Jang , Jong Gun Woo
- 申请人: Sang Ho Yoon , Su Yeol Lee , Doo Go Baik , Seok Beom Choi , Tae Sung Jang , Jong Gun Woo
- 申请人地址: KR Gyunggi-do
- 专利权人: Samsung LED Co., Ltd.
- 当前专利权人: Samsung LED Co., Ltd.
- 当前专利权人地址: KR Gyunggi-do
- 代理机构: Lowe, Hauptman, Ham & Berner, LLP
- 优先权: KR10-2006-0078617 20060821; KR10-2007-0025229 20070314
- 主分类号: H01L21/56
- IPC分类号: H01L21/56
摘要:
A vertical nitride-based semiconductor LED comprises a structure support layer; a p-electrode formed on the structure support layer; a p-type nitride semiconductor layer formed on the p-electrode; an active layer formed on the p-type nitride semiconductor layer; an n-type nitride semiconductor layer formed on the active layer; an n-electrode formed on a portion of the n-type nitride semiconductor layer; and a buffer layer formed on a region of the n-type nitride semiconductor layer on which the n-electrode is not formed, the buffer layer having irregularities formed thereon. The surface of the n-type nitride semiconductor layer coming in contact with the n-electrode is flat.
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