发明授权
- 专利标题: Apparatus and method for extended nitride layer in a flash memory
- 专利标题(中): 闪存中的延伸氮化物层的装置和方法
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申请号: US12706710申请日: 2010-02-16
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公开(公告)号: US08208296B2公开(公告)日: 2012-06-26
- 发明人: Timothy Thurgate , Shenqing Fang , Kuo Tung Chang , Youseok Suh
- 申请人: Timothy Thurgate , Shenqing Fang , Kuo Tung Chang , Youseok Suh
- 申请人地址: US CA Sunnyvale
- 专利权人: Spansion LLC
- 当前专利权人: Spansion LLC
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: Frommer, Lawrence & Haug LLP
- 代理商 Matthew M. Gaffney
- 主分类号: G11C11/34
- IPC分类号: G11C11/34
摘要:
A method and apparatus for storing information is provided. A core region of memory includes a semiconductor layer, at least one shallow trench, an insulator, and a charge-trapping layer. The semiconductor layer includes at least one source/drain region, and the insulator disposed above the source/drain region. The charge trapping layer is within the insulator, and the charge trapping layer is above the entire width of the source/drain region, and extends at least one angstrom beyond the width of the source/drain region, so that a portion the charge trapping layer extends into at least one shallow trench.
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