发明授权
- 专利标题： Photoacid generator and photoreactive composition
- 专利标题（中）： 光酸发生剂和光反应性组合物
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申请号： US12741325申请日： 2008-10-30
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公开(公告)号： US08216768B2公开(公告)日： 2012-07-10
- 发明人: Katsumasa Yamamoto , Hirofumi Yamaguchi , Michio Suzuki
- 申请人： Katsumasa Yamamoto , Hirofumi Yamaguchi , Michio Suzuki
- 申请人地址： JP Kako-gun
- 专利权人： Sumitomo Seika Chemicals Co., Ltd.
- 当前专利权人： Sumitomo Seika Chemicals Co., Ltd.
- 当前专利权人地址： JP Kako-gun
- 代理机构： Westerman, Hattori, Daniels & Adrian, LLP
- 优先权： JP2007-307632 20071128; JP2007-307633 20071128; JP2007-307634 20071128
- 国际申请： PCT/JP2008/069783 WO 20081030
- 国际公布： WO2009/069428 WO 20090604
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/028 ; C07D409/12
摘要：
A photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product. A dithienyl sulfide disulfonium salt represented by the formula (A1): a dithienyl sulfide sulfonium salt represented by the formula (B1): and a phenylthiothiophene sulfonium salt represented by the formula (C1):
公开/授权文献
- US20100233621A1 PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION 公开/授权日：2010-09-16
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