发明授权
- 专利标题: Remote plasma processing of interface surfaces
- 专利标题(中): 界面表面远程等离子体处理
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申请号: US13019854申请日: 2011-02-02
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公开(公告)号: US08217513B2公开(公告)日: 2012-07-10
- 发明人: George Andrew Antonelli , Jennifer O'Loughlin , Tony Xavier , Mandyam Sriram , Bart van Schravendijk , Vishwanathan Rangarajan , Seshasayee Varadarajan , Bryan L. Buckalew
- 申请人: George Andrew Antonelli , Jennifer O'Loughlin , Tony Xavier , Mandyam Sriram , Bart van Schravendijk , Vishwanathan Rangarajan , Seshasayee Varadarajan , Bryan L. Buckalew
- 申请人地址: US CA San Jose
- 专利权人: Novellus Systems, Inc.
- 当前专利权人: Novellus Systems, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Weaver Austin Villeneuve & Sampson LLP
- 主分类号: H01L23/34
- IPC分类号: H01L23/34
摘要:
Embodiments related to the cleaning of interface surfaces in a semiconductor wafer fabrication process via remote plasma processing are disclosed herein. For example, in one disclosed embodiment, a semiconductor processing apparatus includes a processing chamber, a load lock coupled to the processing chamber via a transfer port, a wafer pedestal disposed in the load lock and configured to support a wafer in the load lock, a remote plasma source configured to provide a remote plasma to the load lock, and an ion filter disposed between the remote plasma source and the wafer pedestal.
公开/授权文献
- US20110120377A1 REMOTE PLASMA PROCESSING OF INTERFACE SURFACES 公开/授权日:2011-05-26