发明授权
- 专利标题： Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
- 专利标题（中）： 采用能量激励局部去除固体冷凝气体层的剥离图案化工艺
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申请号： US12381502申请日： 2009-03-12
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公开(公告)号： US08221595B2公开(公告)日： 2012-07-17
- 发明人: Daniel Branton , Jene A Golovchenko , Gavin M King , Warren J MoberlyChan , Gregor M Schurmann
- 申请人： Daniel Branton , Jene A Golovchenko , Gavin M King , Warren J MoberlyChan , Gregor M Schurmann
- 申请人地址： US MA Cambridge
- 专利权人： President and Fellows of Harvard College
- 当前专利权人： President and Fellows of Harvard College
- 当前专利权人地址： US MA Cambridge
- 代理商 Theresa A. Lober
- 主分类号： C23C14/34
- IPC分类号： C23C14/34
摘要：
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.
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