发明授权
- 专利标题: Via structure integrated in electronic substrate
- 专利标题(中): 集成在电子基板中的通孔结构
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申请号: US12637104申请日: 2009-12-14
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公开(公告)号: US08227708B2公开(公告)日: 2012-07-24
- 发明人: Xia Li , Wei Zhao , Yu Cao , Shiqun Gu , Seung H. Kang , Ming-Chu King
- 申请人: Xia Li , Wei Zhao , Yu Cao , Shiqun Gu , Seung H. Kang , Ming-Chu King
- 申请人地址: US CA San Diego
- 专利权人: QUALCOMM Incorporated
- 当前专利权人: QUALCOMM Incorporated
- 当前专利权人地址: US CA San Diego
- 代理商 Michelle Gallardo; Nicholas J. Pauley; Jonathan T. Velasco
- 主分类号: H05K1/11
- IPC分类号: H05K1/11
摘要:
A system of via structures disposed in a substrate. The system includes a first via structure that comprises an outer conductive layer, an inner insulating layer, and an inner conductive layer disposed in the substrate. The outer conductive layer separates the inner insulating layer and the substrate and the inner insulating layer separates the inner conductive layer and the outer conductive layer. A first signal of a first complementary pair passes through the inner conductive layer and a second signal of the first complementary pair passes through the outer conductive layer. In different embodiments, a method of forming a via structure in an electronic substrate is provided.
公开/授权文献
- US20110139497A1 Via Structure Integrated in Electronic Substrate 公开/授权日:2011-06-16
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