发明授权
- 专利标题: Manufacturing apparatus and manufacturing method of light-emitting device
- 专利标题(中): 发光装置的制造装置及其制造方法
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申请号: US12123902申请日: 2008-05-20
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公开(公告)号: US08232038B2公开(公告)日: 2012-07-31
- 发明人: Yoshiharu Hirakata , Hisao Ikeda , Takahiro Ibe , Shunpei Yamazaki
- 申请人: Yoshiharu Hirakata , Hisao Ikeda , Takahiro Ibe , Shunpei Yamazaki
- 申请人地址: JP
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Husch Blackwell LLP
- 优先权: JP2007-147413 20070601
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Demands such as higher definition, higher opening aperture, and higher reliability on a full-color flat panel display have been increased. Such demands are big objects in advancing higher definition (increase in the number of pixels) of a light-emitting device and miniaturization of each display pixel pitch with reduction in size of the light-emitting device. An organic compound-containing layer is selectively deposited using a laser beam which passes through openings of a mask. An irradiated substrate provided with a light absorption layer and a material layer containing an organic compound and a deposition substrate provided with first electrodes are placed so as to face each other. The light absorption layer is heated by a laser beam which has passed through the openings of the mask, and the organic compound at a position overlapping with the heated region is vaporized, and accordingly the organic compound is selectively deposited over the deposition substrate.
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