利索-全球专利检索

  1. 登录
  2. 注册
发明授权
US08236132B2 Substrate processing system and substrate transfer method 有权
基板处理系统和基板转印方法

Substrate processing system and substrate transfer method
摘要：
A substrate processing system (100) includes a first automated substrate transfer line or main transfer line (20) configured to transfer wafers (W) over the entire system and to transfer wafers to and from respective process sections, and a second automated substrate transfer line or auxiliary transfer line (30) configured to transfer wafers (W) inside a photolithography process section (1a). The auxiliary transfer line (30) is disposed as a transfer mechanism independent of the main transfer line (20). An OHT (31) is configured to travel around on the auxiliary transfer line (30) having a loop shape, so as to transfer wafers (W) to and from and among the respective process apparatuses in the photolithography process section (1a).
摘要（中）：

衬底处理系统（100）包括第一自动化衬底传送线或主传输线（20），其被配置为在整个系统上传送晶片（W）并将晶片传送到相应工艺部分和从相应工艺部分传送晶片，以及第二自动衬底传送线 或辅助传输线（30），其配置成在光刻工艺部分（1a）内转移晶片（W）。 辅助传输线（30）被设置为独立于主传输线（20）的传送机构。 OHT（31）构造成在具有环形的辅助传输线（30）周围行进，以便在光刻处理部分（1a）中将晶片（W）传送到各自的处理装置之间和从各个处理装置传送晶片（W）。

公开/授权文献
信息查询
Espacenet
0/0