发明授权
- 专利标题: Advanced process control for new tapeout product
- 专利标题(中): 新的流片产品的高级过程控制
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申请号: US12616681申请日: 2009-11-11
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公开(公告)号: US08239056B2公开(公告)日: 2012-08-07
- 发明人: Chih-Wei Hsu , Yu-Jen Cheng , Wen-Pin Liu , Shun-Ping Wang , Shin-Rung Lu , Jo Fei Wang , Jong-I Mou , Andy Tsen , Chun-Hsien Lin
- 申请人: Chih-Wei Hsu , Yu-Jen Cheng , Wen-Pin Liu , Shun-Ping Wang , Shin-Rung Lu , Jo Fei Wang , Jong-I Mou , Andy Tsen , Chun-Hsien Lin
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
The present disclosure provides a semiconductor manufacturing method. The method includes providing product data of a product, the product data including a sensitive product parameter; searching existing products according to the sensitive product parameter to identify a relevant product from the existing products; determining an initial value of a processing model parameter to the product using corresponding data of the relevant product; assigning the initial value of the processing model parameter to a processing model associated with a manufacturing process; thereafter, tuning a processing recipe using the processing model; and performing the manufacturing process to a semiconductor wafer using the processing recipe.
公开/授权文献
- US20110112678A1 ADVANCED PROCESS CONTROL FOR NEW TAPEOUT PRODUCT 公开/授权日:2011-05-12